一种基于泰伯子像的光刻系统并由期望图案设计掩膜板的方法  

Designing Mask Based on Talbot Sub-image and Expected Patterns in Lithography System

作　　者：荣南楠 张宝昊 何张登 刘帅 李凯强 吕俊君 RONG Nannan;ZHANG Baohao;HE Zhangdeng;LIU Shuai;LI Kaiqiang;LYU Junjun(Chongqing BOE Optoelectronics Technology Co.,Ltd,Chongqing 400714,China.)

机构地区：[1]重庆京东方光电科技有限公司

出　　处：《集成电路应用》2019年第11期5-7,共3页Application of IC

基　　金：重庆市科技企业科技创新课题项目

摘　　要：提出一种基于泰伯效应利用泰伯子像实现光刻,并利用反演光刻技术由期望图案设计掩膜板的方 法。泰伯子像是在分数倍泰伯距离上出现的一种像元倍增且呈棋盘状分布的自成像。根据菲涅耳衍射理 论分析可知,泰伯子像是两种泰伯像在同一平面的叠加,像元数量是两种泰伯像像元之和,即像元倍 增,由于叠加的两种泰伯像相位差 180°,呈现出棋盘状分布的现象。基于泰伯子像的成像现象,研究一 种掩膜板设计方法,针对一些特定的工艺窗口,将其转化为期望图案,由期望图案利用反演光刻技术设 计掩膜板图案。将期望的图案作为泰伯子像的结果利用反演算法推算出掩膜板的图案分布以及参数。A method of photolithography based on Talbot effect using Talbot sub-image is proposed. And the mask is designed from the desired pattern by inverse lithography technique. Talbot image is self-imaging with image element multiplication and chessboard distribution appearing at fractional Talbot distance. According to Fresnel diffraction theory Talbot sub-image is the superposition of two Talbot images on the same plane and the image element multiplication. Due to the phase difference of the two superimposed Talbot images of 180 degrees. Thus, it presents the phenomenon of chessboard distribution. Based on the imaging phenomenon of Talbot image, a mask design method is proposed. For some specific process windows, the desired pattern is transformed into the desired pattern, and the mask pattern is designed by using the inverse lithography technique. The expected pattern is taken as the result of Talbot image, and the pattern distribution and parameters of the mask are calculated by inversion algorithm.

关 键 词：泰伯效应 泰伯子像 掩膜板 Talbot 光刻机 

分 类 号：TN402[电子电信—微电子学与固体电子学] TN383.1