激光超衍射光刻原理与技术  

Principle and Technology of Laser Super-Diffraction Lithography

作　　者：梁紫鑫 赵圆圆 段宣明 Liang Zixin;Zhao Yuanyuan;Duan Xuanming(Guangdong Provincial Key Laboratory of Optical Fiber Sensing and Communications,Institute of Photonics Technology,Jinan University,Guangzhou 511443,Guangdong,China)

机构地区：[1]暨南大学光子技术研究院,广东省光纤传感与通信技术重点实验室,广东广州511443

出　　处：《激光与光电子学进展》2022年第9期470-492,共23页Laser & Optoelectronics Progress

基　　金：广州市重点领域研发计划项目(202007010002);国家重点研发计划(2016YFA0200500)。

摘　　要：现有主流光刻技术与设备变得越来越复杂的原因之一在于其仍然囿于线性光学光刻范畴,未能突破光学衍射极限,是衍射极限附近的光刻技术。采用紫外、可见或近红外等长波长光源进行纳米光刻,必须突破光学衍射极限,实现超衍射光刻,研究和发展激光超衍射纳米光刻技术具有十分重要的科学意义和应用价值。本文从光学衍射极限的基本概念出发,系统阐述各类超衍射光刻原理与方法,重点回顾激光远场超衍射光刻相关研究成果与最新进展,并对其现存的问题和发展方向进行评述。The technology and instrument of current photolithography applied in semiconductor industry have been very complex and expensive due to the diffraction limit barrier of linear optics.For achieving nanoscale lithography with visible and near-infrared light,the lithography method is necessary to breaking the diffraction limit.In this article,we introduce the principles and methods of super-diffraction lithography technology,review the progress and current status of laser super-diffraction lithography with problem discussion and prospect of development.

关 键 词：光刻 超衍射 激光直写 投影光刻 非线性光学 光刻分辨率 光刻效率 

分 类 号：O436[机械工程—光学工程]