DJ—2可变矩形电子束曝光机  

DJ-2 Variably Shaped Electron Beam Lithography System

作　　者：吴明均[1] 黄兰友[1] 

机构地区：[1]中国科学院科学仪器厂

出　　处：《电子显微学报》1992年第2期137-143,共7页Journal of Chinese Electron Microscopy Society

摘　　要：电子束曝光机用于制造超大规模集成电路掩模版。它由电子光学柱、工件台、图形发生器、计算机及控制系统组成。可变矩形电子束曝光机,具有生产效率高,图形产生灵活等优点。束斑形状的变化是通过投影两个方光栏的象来实现的,用静电偏转的方法把第一方光栏的象相对于第二方光栏移动,两者重合组成的矩形象经缩小并投身到工件台上得到一个可变的矩形束斑。An electron beam lithography system to manufacture reticles of very large scale integrated circuits (VLSI) isdescribed. It consists of an electron-optical column, laser work-stage, pattern generator, computer and control sys- tem. Variably shaped electron beam lithography increases the exposure rate and provides more flexible pattern gen- eration. Spots are shaped by projecting two square apertures simultaneously, and by laterally shifting the image of first aperture electrostatically with respect to the second. The compound image is subsequently demagnified and projected onto the target.

关 键 词：电子束曝光机 曝光机 VLSI 

分 类 号：TN470.57[电子电信—微电子学与固体电子学]