离子束溅射沉积Ta_2O_5光学薄膜的实验研究  

Experimental study for ion beam sputtering deposition of Ta_2O_5 optical thin film

作　　者：刘洪祥[1] 熊胜明[1] 李凌辉[1] 张云洞[1] 

机构地区：[1]中国科学院光电技术研究所,四川成都610209

出　　处：《光电工程》2004年第3期41-43,55,共4页Opto-Electronic Engineering

基　　金：国家高技术激光技术领域资助项目

摘　　要：根据择优溅射的理论,在不同的通氧方式下,详细分析了离子辅助对离子束溅射沉积Ta2O5薄膜光学特性的影响。结果表明,在薄膜生长的过程中,由于氩离子的轰击作用,薄膜中的氧原子被优先溅射出来,造成了薄膜化学剂量比失调、吸收增加。但是,通过优化辅助离子源中氧气的比例,可获得合理化学剂量比、低损耗的Ta2O5薄膜。According to the preferred sputtering theory, the influence of ion assist bombardment on optical properties of ion beam sputtering deposited Ta2O5 film under different oxygen introducing conditions is analyzed. The results show that during the growing process of film, oxygen atoms are first sputtered in thin films because the bombardment of argon ion and this leads to chemical dosage on film disproportional and absorption increase. The reasonable chemical dosage ratio and Ta2O5 film with low loss can be obtained through optimizing oxygen ratio in assist ion source.

关 键 词：离子束溅射 光学薄膜 离子辅助沉积 光学特性 

分 类 号：O484.4[理学—固体物理]