国家自然科学基金(11165012)

作品数：8被引量：4H指数：1
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相关作者：袁强华殷桂琴周永杰李娇娇李斐更多>>
相关机构：西北师范大学青海师范大学更多>>
相关期刊：《西北师范大学学报（自然科学版）》《Plasma Science and Technology》更多>>
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13.56 MHz/94.92 MHz双频容性耦合氩等离子体特性研究被引量：2
《西北师范大学学报（自然科学版）》2019年第4期56-62,共7页袁强华 孟祥国 殷桂琴 吴良超 刘珊珊 
国家自然科学基金资助项目(11165012)
利用高频频率(HF)为94.92MHz,低频频率(LF)为13.56MHz获得了氩等离子体.采用发射光谱法(OES)监测并诊断了氩等离子体的演化过程.基于费米-狄拉克模型计算了电子温度,用连续谱绝对强度法计算了电子密度.结果表明,电子温度随着低频功率的...
关键词：双频容性耦合 电子温度 电子密度 等离子体 
OES diagnostic of radicals in 33MHz radio-frequency Ar/C_2H_5OH atmospheric pressure plasma jet
《Plasma Science and Technology》2019年第2期52-59,共8页Qianghua YUAN Pei REN Yongjie ZHOU Guiqin YIN Chenzhong DONG 
support provided by National Natural Science Foundation of China (No. 11165012);Project of Natural Science Foundation of GanSu province (No. 145RJZA159);China Postdoctoral Science Foundation funded project (Nos. 2011M501494 and 2012T50831)
Ar/C_2H_5OH plasma jet is generated at atmospheric pressure by 33 MHz radio-frequency power source. This RF excitation frequencies which are higher than 13.56 MHz had rarely been used in atmospheric pressure plasma. T...
关键词：ATMOSPHERIC pressure plasma optical emission spectroscopy RADICAL analysis 
Deposition of organosilicone thin film from hexamethyldisiloxane(HMDSO)with 50kHz/33MHz dual-frequency atmospheric-pressure plasma jet被引量：1
《Plasma Science and Technology》2017年第4期92-98,共7页李娇娇 袁强华 常小伟 王勇 殷桂琴 董晨钟 
supported by National Natural Science Foundation of China(Grant No.11165012,Grant No. 11665012);the Project of the Natural Science Foundation of GanSu(145RJZA159)
The deposition of organosilicone thin films from hexamethyldisiloxane（HMDSO） by using a dual-frequency （50 kHz/33 MHz） atmospheric-pressure micro-plasma jet with an admixture of a small volume of HMDSO and Ar was ...
关键词：organosilicone thin film HEXAMETHYLDISILOXANE dual-frequency atmospheric-pressureplasma jet 
乙醇掺氮放电大气压等离子体射流的光谱特征研究
《西北师范大学学报（自然科学版）》2016年第6期46-50,共5页周永杰 李斐 县涛 张国喜 袁强华 
国家自然科学基金资助项目(11165012);甘肃省自然科学基金资助项目(145RJZA159);青海省自然科学基金资助项目(2016-ZJ-954Q);教育部春晖计划合作科研项目(Z2015047,Z2015048)
对乙醇放电的大气压等离子体射流进行了研究.用发射光谱(OES)法观察了等离子体光谱中的C,CN,CH和C_2基团.在Ar与乙醇混合物等离子体的光谱中,分别在473.7,516.4和563.5nm处出现了3个明显的C_2分子谱线;在388.3nm出现了CN自由基分子谱线...
关键词：大气压等离子体射流 基团 谱线强度 
Ar/SiCl4大气压等离子体射流沉积SiO2薄膜
《西北师范大学学报（自然科学版）》2016年第2期38-42,共5页袁强华 常小伟 李娇娇 殷桂琴 
国家自然科学基金资助项目(11165012);甘肃省自然科学基金资助项目(145RJZA159)
以氩气为携带气体,SiCl4为源材料,使用双频(50kHz/33 MHz)组合功率源大气压等离子体射流(APPJ)装置,以空气中的氧气作为氧化物质沉积SiO2薄膜.用发射光谱检测等离子体组成物种,并研究了随源材料(SiCl4)含量的不同,体系内各主要物种的变...
关键词：大气压等离子体射流 双频激发 SIO2薄膜 
Optical Spectroscopic Investigation of Ar/CH_3OH and Ar/N_2/CH_3OH Atmospheric Pressure Plasma Jets
《Plasma Science and Technology》2014年第2期99-103,共5页周永杰 袁强华 王晓敏 殷桂琴 董晨钟 
supported by National Natural Science Foundation of China(No.11165012);China Postdoctoral Science Foundation Funded Project(Nos.2011M501494,2012T50831);Project of Key Laboratory of Atomic and Molecular Physics & Functional Materials of Gansu Province,China;Project of Northwest Normal University of China(NWNU-LKQN-11-9)
Ar/CH3OH and Ar/N2/CH3OH plasma jets were generated at atmospheric pressure by dual-frequency excitations. Two different cases were studied with focus laid on the generation of CN radicals. In one case Ar gas passed t...
关键词：atmospheric pressure plasma jet carbonaceous species optical emission spec- troscopy dual-frequency excitation 
Deposition of Polymer Thin Film Using an Atmospheric Pressure Micro-Plasma Driven by Dual-Frequency Excitation
《Plasma Science and Technology》2014年第1期68-72,共5页王晓敏 袁强华 周永杰 殷桂琴 董晨钟 
supported by National Natural Science Foundation of China(No.11165012);China Postdoctoral Science Foundation Funded Project(2011M501494;2012T50831);Project of Key Laboratory of Atomic and Molecular Physics&Functional Materials of Gansu Province;Project of Northwest Normal University(NWNU-LKQN-11-9)
Polymer thin film deposition using an atmospheric pressure micro-plasma jet driven by dual-frequency excitations is described in this paper. The discharge process was operated with a mixture of argon （6 slm） and a s...
关键词：atmospheric pressure plasma dual-frequency excitation polymer thin film 
Effect of Oxygen Plasma on Low Dielectric Constant HSQ (Hydrogensilsesquioxane) Films被引量：1
《Plasma Science and Technology》2013年第1期86-88,共3页袁强华 殷桂琴 宁兆元 
supported by National Natural Science Foundation of China(No.11165012);China Postdoctoral Science Foundation Funded Project(2011M501494,2012T50831);Project of Graduate Supervisor of Gansu Province(No.1001-01);Project of Key Laboratory of Atomic and Molecular Physics & Functional Materials of Gansu Province,Project of Northwest Normal University(NWNU-LKQN-11-9,NWNU-KJCXGC-03-62)
The commercially available hydrogensilsesquioxane （HSQ） offers a low dielectric constant. In this paper, the impact of oxygen plasma treatment has been investigated on the low- k HSQ films. Fourier transform infrar...
关键词：thin films oxygen plasma exposure ANNEALING 
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