A boron-silicon film was formed from boron trichloride gas and dichlorosilane gas at about 900℃in ambient hydrogen at atmospheric pressure utilizing a slim vertical cold wall chemical vapor deposition reactor de...
A dichlorosilane gas and a trichlorosilane gas in ambient hydrogen were evaluated to show their different gas flow motions in a slim vertical cold wall chemical vapor deposition reactor for the Minimal Fab system. Thi...
support from the National Natural Science Foundation of China(No.50473036)
Methyl-(γ-chloropropyl)dichlorosilane was synthesized under the catalysis of a silicasupported Karstedt-type catalyst. By orthogonal experimental design method, the optimum reaction parameters such as reactants rat...