Supported by the National Natural Science Foundation of China under Grant Nos 60736033 and 60506020.
Hot-carrier degradation for 90 nm gate length lightly-doped drain (LDD) NMOSFET with ultra-thin (1.4 nm) gate oxide is investigated under the low gate voltage stress (LGVS) and peak substrate current (Isub max...
In this paper based on the forward gated-diode configuration, the hot carrier behavior of the SOI (Silicon-on-insulator) nMOSFET's operating in a Bi-MOS hybrid mode (abbreviated as Bi-nMOSFET) is investigated. The per...