纳米硅薄膜表面形貌分形特征的STM研究  

Study on Fractal Characteristics of Surface Morphology of Nano-Crystalline Silicon Film

作　　者：万明芳[1] 魏希文[1] 李建军[1] 邹赫麟[1] 袁凯华[1] 何宇亮[1] 

机构地区：[1]大连理工大学物理系,北京航空航天大学非晶态物理研究室

出　　处：《Journal of Semiconductors》1995年第12期917-920,共4页半导体学报（英文版）

摘　　要：利用扫描隧道显微镜（ＳｃａｎｎｉｎｇＴｕｎｎｅｌｉｎｇＭｉｃｒｏｓｃｏｐｅ，简称ＳＴＭ）对纳米硅薄膜在纳米尺度上的表面微观形貌进行了研究，结合分形理论，计算出样品表面形貌的分形维数Ｄ，从而得出Ｄ与有关样品微结构参数之间的关系．ＳＴＭ结合图象处理和傅利叶分析法可以很好地研究薄膜材料表面形貌的分形特征．纳米硅薄膜的表面在纳米尺度上的微观形貌呈现出分形特征．Abstract The surface micro-morphology of nano-crystalline silicon film is studied by using scanning tunneling microscope (STM ). The fractal dimension D of the sample surface morphology is calculated by associating with the fractal theory. The dependence of D on the related parameters of the s.lrnple microstructures is obtained. the fractal characteristics of the surface morphology of films can be well studied by STM, which combines with the methods of the image processing and Fourier analysis. The micromorphology of the surface of nano-crystalline silicon films presents fractal characteristics in nanometer size.

关 键 词：纳米硅薄膜 表面形貌 分形 STM 

分 类 号：TN304.12[电子电信—物理电子学]