X射线W/B_4C宽带多层膜的优化设计和制备  

Optimized Design and Fabrication of X-Ray W/B_4C Broadband Multilayer Film

作　　者：姚志华[1] 金春水[1] 杨雄[1] 张立超[1] 金伟华[1] 曹健林[1] 

机构地区：[1]中国科学院长春光学精密机械与物理研究所应用光学国家重点实验室,长春130033

出　　处：《光学学报》2005年第10期1433-1435,共3页Acta Optica Sinica

摘　　要：介绍了X射线宽带多层膜材料W和B4C的选定方法,依据伯宁(BERNING)公式确定出了在0.154 nm处X射线宽带多层膜的最佳膜对数.引入适当的评价函数,利用具有全局寻优特性且效率较高的遗传算法,在波长0.154 nm处优化设计出了掠入射角(θ)0.5°～0.9°范围内反射率值达到40%的宽角度宽带多层膜.宽带多层膜反射镜采用磁控溅射方法制备,并用X射线衍射仪对样品进行了检测,结果表明在掠入射角(2θ)1.0°～1.8°之间的相对反射率光谱曲线比较平坦.A method of selecting and confirming materials with W and B4C for X-ray broadband multilayer film is presented. The minimum bilayers number of X-ray broadband multilayer film has been confirmed by using BERNING formula at the wavelength 0. 154 nm. After introducing the suitable merit function, a broad angular broadband W/B4C multilayer film has been designed successfully by using genetic algorithm. The flat reflectance of broadband multilayer film is 40% in the wavelength 0. 154 nm at the grazing incidence angel （θ） of 0.5°-0.9°. The multilayer film has been fabricated on the magnetron sputtering system. A flat relative reflectance spectrum curve has been measured at the grazing incidence angle （θ） of 1.0°-1.8°by X-ray diffractometer.

关 键 词：X射线光学 宽带多层膜 评价函数 遗传算法 磁控溅射 

分 类 号：O484.4[理学—固体物理]