非平衡磁控溅射法类金刚石薄膜的制备及分析  

Investigation of diamond-like-carbon films prepared by unbalanced magnetron sputtering

作　　者：杨武保[1] 范松华[2] 张谷令[2] 马培宁[1] 张守忠 杜健 

机构地区：[1]石油大学(北京)机电工程学院,北京102249 [2]中国科学院物理研究所,北京100080 [3]北京丹普表面技术公司,北京100096

出　　处：《物理学报》2005年第10期4944-4948,共5页Acta Physica Sinica

基　　金：国家自然科学基金(批准号:50071068)资助的课题.~~

摘　　要：利用非平衡磁控溅射物理气相沉积技术制备了光滑、致密、均匀的类金刚石薄膜.分析沉积工艺参数对所得类金刚石薄膜的电学特性的影响以及溅射粒子的大小、能量、碰撞及沉积过程中的相变机理后认为溅射粒子越小、与环境气体分子的碰撞次数越多、与衬底相互作用时具有适当动量等,能够有效提高薄膜中sp3杂化碳原子的含量.利用拉曼光谱、纳米力学探针、红外光谱、扫描电镜等分析了所得类金刚石膜的结构、力学及光学性能、表面形貌等特征.结果表明,类金刚石膜中sp3杂化碳原子的含量较高,显微硬度大于11GPa,薄膜光学透过率达到89·4%,折射系数为1·952,沉积速率为0·724μm/h,表面光滑、致密、均匀,不存在明显的晶粒特征.Using unbalanced magnetron sputtering method, smooth, dense and uniform diamond like carbon films （DLC） with high diamond phase content are deposited. Based on testing and analysis of deposition mechanism, we conclude that with smaller sputtering clusters and higher collision frequency between the sputtering cluster and environment molecules, and more suitable momentum of the sputtering cluster impacting on the substrate, higher content of diamond phase in the film will result. Scanning electron micrograph shows that there are no obvious grains in this film. The micro-hardness is about 11 GPa, bulk elastic modulus is about 120 GPa as tested by nano-indentation. The optical transmittance is about 89%, refraction coefficient is 1.952, and the deposition rate is 0.724μm/h as calculated from the FTIR spectra.

关 键 词：非平衡磁控溅射 类金刚石膜 拉曼光谱 红外光谱 类金刚石薄膜 磁控溅射法 制备 气相沉积技术 力学探针 表面光滑 

分 类 号：O484[理学—固体物理]