高线密度X射线透射光栅的制作工艺  

Fabrication of High-Density Transmission Gratings for X-Ray Diffraction

作　　者：朱效立[1] 马杰[1] 曹磊峰[2] 杨家敏[2] 谢常青[1] 刘明[1] 陈宝钦[1] 牛洁斌[1] 张庆钊[1] 姜骥[1] 赵珉[1] 叶甜春[1] 

机构地区：[1]中国科学院微电子研究所纳米加工与新器件集成技术实验室,北京100029 [2]中国工程物理研究院激光聚变中心,绵阳621900

出　　处：《Journal of Semiconductors》2007年第12期2006-2010,共5页半导体学报（英文版）

基　　金：国家重点基础研究发展规划(批准号:2007CB935302);国家高技术研究发展计划(批准号:2006AA843134);国家自然科学基金(批准号:90607022)资助项目~~

摘　　要：采用电子束光刻、X射线光刻和微电镀技术,成功制作了面积为10mm×0.5mm,周期为500nm,占空比为1∶1,金吸收体厚度为430nm的可用于X射线衍射的大面积透射光栅.首先利用电子束光刻和微电镀技术制备基于镂空薄膜结构的X射线光刻掩模,然后利用X射线光刻经济、高效地复制X射线透射光栅.整个工艺流程分别利用了电子束光刻分辨率高和X射线光刻效率高的优点,并且可以得到剖面陡直的纳米级光栅线条.最后,测量了制作出的X射线透射光栅对波长为11nm同步辐射光的衍射峰,实验结果表明该光栅具有良好的衍射特性.Large area transmission gratings （TG） for soft X-ray diffraction, with an area of 10mm×0.5mm, a period of 500nm,a line-space ratio of 1 ： 1,and a gold thickness of 430nm, are successfully fabricated by combining electron beam lithography （EBL）, X-ray lithography （XRL）, and electroplating. In the processes, the mask of TG with well-defined three di- mensional relief structures is originally patterned by EBL and then by electroplating. Next, the processes of XRL and electro- plating allow us to efficiently and cost-effectively fabricate many copies of TG with the following two major advantages： high resolution and a vertical cross section. Moreover, the measurement of its efficiency has shown its perfect performance with respect to diffraction of EUV light.

关 键 词：电子束光刻 透射光栅 X射线光刻 X射线衍射光学元件 

分 类 号：TN253[电子电信—物理电子学]