硬质薄膜技术的最新发展  

Recent development of hard film preparation processes

作　　者：杨林生[1] 王君[1] 陈长琦[1] 

机构地区：[1]合肥工业大学机械与汽车工程学院,安徽合肥230009

出　　处：《真空》2009年第6期35-39,共5页Vacuum

摘　　要：为满足各技术领域的要求,硬质薄膜业近年来得到了广泛的发展和应用。本文介绍了硬质薄膜技术的最新发展状况,阐述了各技术的特点和代表厂商。首先对CVD及其相关技术的发展情况进行了简介,再对PVD技术在硬质薄膜领域的应用进行了详述,最后对国内相关产业的发展进行了介绍和总结,同时本文对硬质薄膜技术在我国未来的发展提出了展望。In recent years, hard film industry has been developing rapidly to achieve better properties so as to meet the application requirements in various fields. Latest development of hard film preparation processes is lriefly described, as well as their characteristics and typical manufacturers. Discussing briefly the basic trend of CVD processes, the applications of PVD to hard film preparation are emphatically discussed in detail. The current situation of films and related industries in China are summarized with an outlook given on the development of China＇s hard film preparation processes.

关 键 词：硬质薄膜 化学气相沉积 物理气相沉积 阴极电弧 磁控溅射 

分 类 号：TB43[一般工业技术]