3333l/mmX射线全镂空自支撑透射光栅的制备与测试  

Fabrication and Measurement of 3333 l/mm X-Ray Self-Standing Transmission Gratings

作　　者：李海亮[1,2] 马杰[2] 朱效立[2] 吴坚[1] 谢常青[2] 陈宝钦[2] 刘明[2] 

机构地区：[1]北京工业大学激光工程研究院,北京100022 [2]中国科学院微电子研究所纳米加工与新器件集成技术实验室,北京100029

出　　处：《微纳电子技术》2010年第3期174-178,共5页Micronanoelectronic Technology

基　　金：国家重点基础研究发展计划项目(2007CB935302);国家高技术研究发展计划(2008AA8040208);国家自然科学基金(60825403)

摘　　要：针对我国对高线密度X射线镂空透射光栅在空间环境探测和激光等离子体诊断方面的需求,将电子束光刻和X射线光刻技术相结合,制备出3333l/mmX射线全镂空透射光栅,栅线宽度接近150nm,周期300nm,栅线厚度为500nm,有效光栅面积达到60%。首先利用电子束光刻和微电镀技术在镂空聚酰亚胺薄膜底衬上制备X射线母光栅掩模,然后利用X射线光刻和微电镀技术实现了光栅图形的复制品,之后采用紫外光刻和微电镀技术制作加强筋结构,最后通过腐蚀体硅和等离子体刻蚀聚酰亚胺完成镂空透射光栅的制作。在国家同步辐射实验室光谱辐射和计量实验站上对此光栅在5～23nm波段进行了衍射效率标定。标定结果表明所制备的光栅栅线平滑,占空比合理,侧壁陡直,不同光栅之间一致性好,完全可以满足应用需求。To meet the need of high density X-ray self-standing transmission gratings for space detecting and laser plasma diagnostics in China, 3 333 1/mm self-standing transmission gratings were successfully fabricated with the e-beam lithography and X-ray lithography. The grating bar thickness was 500 nm, the width was 150 nm, the period was 300 nm and the effeetive area was 60%. Firstly, the masks of X-ray master gratings were fabricated on polyimide membrane sub- strates by the e-beam lithography and micro-electroplating technology. Then, the replicas of grating patterns were realized by X-ray lithography and micro-electroplating. After that, the strengthened structures were fabricated with the U-V lithography and micro-electroplating. Finally, the fabrication of X-ray completely hollow-out self-standing transmission gratings werefulfilled by the technology of etching and inductively coupled plasma （ICP）. In National Syn- chronal Radiation Laboratory, the diffraction efficieney of the gratings was measured at 5 - 23 nm band. The results show that the gratings are of smooth bars, reasonable ratio, steep straight profile, and outstanding consistency, satisfying the application requirements.

关 键 词：镂空透射光栅 电子束光刻 X射线光刻 微电镀 衍射效率 

分 类 号：TN305[电子电信—物理电子学]