钌金属溅射靶材烧结工艺研究  

STUDY OF MANUFACTURE PROCESS ON RU SPUTTERING TARGET BY PM

作　　者：罗俊锋[1] 丁照崇[1] 董亭义[1] 何金江[1] 王欣平[1] 江轩[1] 

机构地区：[1]北京有色金属研究总院有研亿金新材料股份有限公司,北京102200

出　　处：《粉末冶金工业》2012年第1期28-31,共4页Powder Metallurgy Industry

摘　　要：采用热压、放电等离子烧结及直接热压等粉末冶金工艺制备了钌金属溅射靶材,通过对致密度、晶粒度与氧含量分析研究了工艺过程对钌金属靶材制备的影响,并对比分析了三种方法制备钌靶的特点。结果表明:通过工艺优化利用三种方法均能制备出相对密度达到99%以上的高密度钌靶;随着制备温度的升高,钌靶氧含量降低,晶粒尺寸增大;热压工艺制备周期最长,钌靶表面有晶粒粗大层;放电等离子烧结与直接热压工艺都具有快速、近净成形的特点。In this study,ruthenium sputtering targets were fabricated by three different powder metallurgical methods,Hot Pressing（HP）,Spark Plasma Sintering（SPS） and Direct Hot Pressing（DHP）.The effects of manufacture methods on Ru target were investigated by comparing the density,grain size and oxygen content.Based on the results,it shows that Ru targets with above 99% relative density could be made by these three methods with optimized manufacture process.The oxygen content and grain size increase with increasing temperature.The manufacture cycle with HP is the longest and there is coarse grain at the surface of the target.Both SPS and DHP can make Ru target with short cycle and near net shape.

关 键 词：钌 溅射靶材 热压烧结 放电等离子烧结 直接热压 

分 类 号：TF124.5[冶金工程—粉末冶金]