金属电极的腐蚀特性研究  

Study of the Corrosive Property of Metal Electrode

作　　者：张照云[1] 施志贵[1] 高杨[1] 席仕伟[1] 彭勃[1] 

机构地区：[1]中国工程物理研究院电子工程研究所,四川绵阳621900

出　　处：《传感技术学报》2012年第3期326-328,共3页Chinese Journal of Sensors and Actuators

基　　金：中国工程物理研究院科学技术发展基金重点课题(20111A0403017)

摘　　要：对金属电极的腐蚀特性进行了研究。实验中设计了多种不同的金属电极,通过改变电极材料、电极厚度、电极层数、腐蚀液成分及温度等条件,研究了金属电极的腐蚀特性。通过研究发现,电极的腐蚀特性跟电极材料、电极厚度、电极层数、电极的缺陷及应力、腐蚀液成分及温度等条件有关。最后设计了一种打底层金属材料为Tiw,层厚20 nm,上层金属为Au,层厚度为200 nm的金属电极,在覆盖一层光刻胶,并对光刻胶进行后烘坚膜的情况下,在常温下,用HF溶液腐蚀1 h后,SOIMEMS微结构完全释放,金属电极还十分完好。The corrosive property of metal electrode is studied. In the experiment, several kinds of metal electrode are designed. By changing the metal material, the metal thickness, the metal layer number, the solution property and corrupt temperature, and so on the other condition, the corrosive property of metal electrode is studied. Through the studies, we finger out that the corrosive property of metal electrode is changing when the metal material, the metal thickness,the metal layer number, the metal＇s flaw numbers and stress, the solution property and corrupt temperature,and so on the other conditions are changed. At last, one metal electrode of Tiw/Au with the Tiw thickness 20nm and Au thickness 200nm is designed. When the metal is covered by photoresist, and the photoresist is hardened, at normal temperature, the metal is good after one hour corrupting in the HF solution.

关 键 词：微机械系统 SOI MEMS 湿法腐蚀 金属电极 

分 类 号：TN305.7[电子电信—物理电子学]