微型电容式压力传感器硅基薄膜的设计与制备  

Design and Fabrication of a Silicon Membrane for Micro Capacitive Pressure Sensors

作　　者：陶也[1] 曾毅波[1] 刘畅[1] 林杰[1] 郭航[1] 

机构地区：[1]厦门大学物理与机电工程学院,萨本栋微米纳米科学技术研究院,福建厦门361005

出　　处：《厦门大学学报（自然科学版）》2013年第5期627-632,共6页Journal of Xiamen University：Natural Science

基　　金：航空科学基金项目(2008ZH68002)

摘　　要：获得均匀、平整的硅基薄膜是制备出高灵敏度的微型电容式压力传感器的关键步骤.首先在理论分析的基础上,确定了微型电容式压力传感器的基本参数,而后在制备中,发展了一种新型的硅基薄膜制作方法,即利用硅-玻璃键合工艺,结合浓KOH溶液超声腐蚀与化学机械抛光的方法,得到了厚度为10μm的均匀、平整的硅基薄膜,为制备微型压力传感器奠定了工艺基础,也可用于其他微机电系统(MEMS)压力传感器.A smooth silicon membrane with uniform thickness is a key factor for a high-sensitivity MEMS-based capacitive pressure sensor. Based on the theoretical analysis, the geometry parameters of the micro capacitive pressure sensors are determined. During the manufacturing, a new method of fabricating silicon membrane is proposed that involves silicon-glass bonding, chemical mechani- cal polishing （CMP） and ultrasonic corrosion in KOH aqua and process technique are discussed in detail. With this method, a silicon membrane with uniform thickness of 10μm is obtained. The silicon membrane fabrication technique developed in this paper can also be used in other MEMS-based capacitive sensors.

关 键 词：微机电系统 电容式压力传感器 硅薄膜 超声腐蚀 化学机械抛光 

分 类 号：TD161.14[矿业工程—矿山地质测量]