磁控溅射CrN_x薄膜的制备与力学性能  

Preparation and mechanical properties of magnetron sputtered CrN_x thin films

作　　者：韩增虎[1] 田家万[1] 戴嘉维[2] 张慧娟[2] 李戈扬[1] 

机构地区：[1]上海交通大学金属基复合材料国家重点实验室,上海200030 [2]上海交通大学教育部高温材料与高温测试重点实验室,上海200030

出　　处：《功能材料》2002年第5期500-502,共3页Journal of Functional Materials

摘　　要：采用反应磁控溅射法在不同的氮分压下制备了一系列CrNx 薄膜 ,并利用EDS和XRD表征了薄膜的成分和相组成 ,采用力学探针测量了薄膜的硬度和弹性模量。研究了氮分压对薄膜成分、相组成和力学性能的影响。结果表明 ,随氮分压的升高 ,薄膜的沉积速率明显降低 ;薄膜中的氮含量增加 ,相应地 ,相组成从Cr +Cr2 N过渡到单相Cr2 N ,再逐步经Cr2 N +CrN过渡到单相CrN ,并在Cr :N原子比为 1∶2和 1∶1时 ,薄膜的硬度出现极值 (HV2 7.1GPa和HV2 6.8GPa) ,而薄膜的弹性模量则在Cr2 N时呈现 3 5 0GPa的最高值。In this paper, CrN x thin films were deposited with reactive magnetron sputtering method. EDX and XRD were employed to characterize their compositon and phases?Their microhardness and elastic modulus were evaluated using a microhardness tester and the effect of N 2 partial pressure on the composition, phase formation and mechnical properties of CrN x thin films was investigated. The results show that the phase formation of CrN x thin films varies from Cr+Cr 2N to single phase Cr 2N, and then from Cr 2N+CrN to single phase CrN with increasing N 2 partial pressure. The microhardness values of these films make a distribution ranging from HV21.4GPa to 27.1GPa, and when the atom ratio of Cr∶N was 1∶2 and 1∶1, thin films reach peak hardness values (HV27.1GPa and HV26.8GPa respectively), while the elastic modulus was maximal (350GPa) when single phase Cr 2N was formed.

关 键 词：制备 磁控溅射 CRNX薄膜 氮分压 力学性能 

分 类 号：O484[理学—固体物理]