CVD金刚石膜研究进展  

Research Progress of CVD Diamond Film

作　　者：权乐 QUAN Le(Sinopec Jiangzuan Petroleum Machinery Company Limited,Wuhan 430223,China;Sinopec Oilfield Equipment Company Limited by Shares,Wuhan 430223,China)

机构地区：[1]中石化江钻石油机械有限公司,武汉430223 [2]中石化石油机械股份有限公司,武汉430223

出　　处：《真空科学与技术学报》2024年第10期841-852,共12页Chinese Journal of Vacuum Science and Technology

基　　金：江钻公司科研项目(JZ2022002-4)。

摘　　要：金刚石由于其优异的声、光、电、热和力学性能,是重要的功能材料之一。金刚石的制备方法主要有高温高压方法和低压化学气相沉积方法。化学气相沉积法因制备得到的样品质量高、面积大,设备简单、可规模化等特性,是合成金刚石膜的重要方法。为了实现低合成压力条件下的金刚石膜的均匀、快速、大尺寸、高质量生长,目前研究人员在金刚石低压生长的控制方面做出了深入的研究。文章综述了近年来化学气相沉积法(包括热丝CVD法、离子体增强CVD法、燃烧火焰CVD法)生长金刚石膜的研究进展,包括金刚石膜的生长机理、关键设备、关键工艺参数等。此外,还详细讨论了生长过程中的关键工艺参数与金刚石膜生长速率和质量的关系,这些对化学气相沉积制备金刚石膜的研究、生产至关重要。Diamond is one of the important functional materials because of its excellent acoustic,optical,electrical,thermal and mechanical properties.The preparation methods of the diamond mainly include high temperature and high pressure(HTHP)method and low pressure chemical vapor deposition(CVD)method.Chemical vapor deposition is an important method for diamond film synthesis due to the characteristics of high quality,large area,simplicity and scalability.At present,thorough research has been done on controlling the lowpressure growth of diamond film to achieve uniform,rapid,large size and high-quality growth.In this paper,the research progress of the CVD method(including hot filament CVD,plasma enhanced CVD,and combustion flame CVD)growing diamond film in recent years is reviewed,including the growing mechanism,key equipment and process parameters.In addition,the relationship between key parameters and growth rate,as well as the quality of diamond film,is discussed in detail,which is very important for the research and production of diamond film prepared by the chemical vapor deposition method.

关 键 词：金刚石膜 化学气相沉积 等离子体增强化学气相沉积 热丝化学气相沉积 燃烧火焰化学 气相沉积 

分 类 号：O782[理学—晶体学]