Project supported by the Scholarship Council of China(Grant No.201508340047);the Postdoctoral Science Foundation of China(Grant No.2016M601993);the Postdoctoral Science Foundation of Anhui Province,China(Grant No.2017B215);the Anhui Province University Outstanding Talent Cultivation Program,China(Grant No.gxfx ZD2016077)
Tailoring the electronic states of the Al N/diamond interface is critical to the development of the next-generation semiconductor devices such as the deep-ultraviolet light-emitting diode, photodetector, and high-powe...
Project supported by the National Natural Science Foundation of China(Grant Nos.61204006 and 61574108);the Fundamental Research Funds for the Central Universities,China(Grant No.7214570101)
High indium semipolar(1122) and polar(0001) In Ga N layers each with a thickness of about 100 nm are realized simultaneously on sapphire substrates by pulsed metal organic chemical vapor deposition(MOCVD). The m...
Semi-polar (1 - 101 ) InGaN/GaN light-emitting diodes were prepared on standard electronic-grade Si (100) substrates. Micro-stripes of GaN and InGaN/GaN quantum wells on semi-polar facets were grown on intersectin...
support by the National High Technology Research and Development Program of China(Green Laser)
In this paper, we investigate the effect of pressure on the growth mode of high quality (10-11) GaN using an epi- taxial lateral over growth (ELO) technique by metal organic chemical vapor deposition (MOCVD). Tw...
Project supported by the Fundamental Research Funds for the Central Universities,China (Grant No. K50511250002);the National Key Science and Technology Special Project,China (Grant No. 2008ZX01002-002);the National Natural Science Foundation of China (Grant Nos. 60736033,60976068,and 61076097)
We report on the growth of the high-quality GaN grain on a r-plane sapphire substrate by using a self-organized SiN interlayer as a selective growth mask. Transmission electron microscopy, scanning electron microscopy...