Supported by the National Natural Science Foundation of China under Grant Nos 61404151 and 61574153
On the basis of a detailed discussion of the development of total ionizing dose (TID) effect model, a new commercial-model-independent TID modeling approach for partially depleted silicon-on-insulator metal-oxide- s...
supported by National Key Basic Research Program of China(Grant No.2011CBA00604)
Remote charge scattering (RCS) has become a serious obstacle inhabiting the performance of ultra- thin gate oxide MOSFETs. In this paper, we evaluate the impact of RCS by treating the real-space full Coulomb interac...