supported by the University of Electronic Science and Technology of China (Y02002010301045);the Foundation of State Key Laboratory of Electronic Thin Films and Integrated Devices (kFJJ200909)
Reactive ion etching was used to etch barium strontium titanate thin films in a CHF3/Ar plasma.BST surfaces before and after etching were analyzed by X-ray photoelectron spectroscopy to investigate the reaction ion et...