supported by the National Key Research and Development Program of China(2017YFA0206600,SQ2020YFE010701);the National Natural Science Foundation of China(51773045,21772030,51922032,21961160720,51473053);the Natural Science Foundation of Hunan Province(2019JJ50603)。
Star nonfullerene acceptors like ITIC[1],IDIC[2],O-IDTBR[3],IT-4 F[4],COi8 DFIC[4],Y6[6]etc.continuously emerge and keep pushing the power conversion efficiency(PCE)of organic solar cells forward.These small molecules...
Project supported by the National Natural Science Foundation of China(Nos.61025020,61274058,61322403,61504057,61574075);the Natural Science Foundation of Jiangsu Province(Nos.BK2011437,BK20130013,BK20150585);the Priority Academic Program Development of Jiangsu Higher Education Institutions;the Fundamental Research Funds for the Central Universities
The authors have reported their recent progress in the research field of ZnO materials as well as the corresponding global advance. Recent results regarding(1) the development of high-quality epitaxy techniques,(2...
Static and dynamic properties of both complementary n-Ge/p-Si and p-Ge/n-Si hetero-junction DoubleDrift IMPATT diodes have been investigated by an advanced and realistic computer simulation technique, devel- oped by t...
Project supported by the National Natural Science Foundation of China(No60876003);the Chinese Academy of Sciences(No Y072011000);the Beijing Municipal Science & Technology Commission(NoD09080300500903);the Knowledge Innovation Program of the Chinese Academy of Sciences(NoISCAS2008T04)
High quality,homoepitaxial layers of 4H-SiC were grown on off-oriented 4H-SiC(0001) Si planes in a vertical low-pressure hot-wall CVD system(LPCVD) by using trichlorosilane(TCS) as a silicon precursor source tog...
supported by the State Key Development Program for Basic Research of China (No. 51327020202);the Key Fund of the Ministryof Education of China (No. 106150);the Xi’an Applied Materials Innovation Fund (No. XA-AM-200607).
Unintentionally doped 4H-SiC homoepitaxial layers grown by hot-wall chemical vapor deposition (HWCVD) have been studied using photoluminescence (PL) technique in the temperature range of 10 to 240 K. A broadband g...