Project supported by the National Natural Science Foundation of China (Grant Nos.60890192,60876009,and 11174182)
Ni/Au Schottky contacts on A1N/GaN and A1GaN/GaN heterostructures are fabricated. Based on the measured current-voltage and capacitance-voltage curves, the electrical characteristics of AlN/GaN Schottky diode, such as...
the National Natural Science Foundation of China(Grant Nos.60890192,60876009,and 11174182);the Foundation of Key Laboratory,China
An Ni/Au Schottky contact on an AlGaN/GaN heterostructure has been prepared. By using the peak-conductance model, the threshold voltage and the series resistance of the AlGaN/GaN diode are simultaneously extracted fro...
Project supported by the National Natural Science Foundation of China(Nos.60890192,60876009)
We report the DC and RF performance of InAlN/GaN high-electron mobility transistors with AlGaN back barrier grown on SiC substrates. These presented results confirm the high performance that is reachable by InAlN-base...
Project supported by the National Natural Science Foundation of China(Nos.60890192,60876009)
Electrical stress experiments under different bias configurations for AlGaN/GaN high electron mobility transistors were performed and analyzed.The electric field applied was found to be the extrinsic cause for the dev...
Project supported by the National Natural Science Foundation of China(Nos.60890192,60876009).
We report high performance InA1N/GaN HEMTs grown on sapphire substrates. The lattice-matched InA1N/GaN HEMT sample showed a high 2DEG mobility of 1210 cmZ/(V.s) under a sheet density of 2.6 × 10^13 cm^-2. Large sig...
supported by the National Natural Science Foundation of China (Grant Nos. 60890192 and 50872146)
Nonpolar a-plane (1120) GaN films have been grown on r-plane (1102) sapphire by metal-organic chemical vapor deposition (MOCVD) under different growth pressures. The as-grown films are investigated by optical mi...
Project supported by the National Natural Science Foundation of China(Nos.60890192,60876009).
An enhancement-mode AlGaN/GaN HEMT with a threshold voltage of 0.35 V was fabricated by fluorine plasma treatment.The enhancement-mode device demonstrates high-performance DC characteristics with a saturation current ...