supported by National Key Research and Development Program of China(Grant No.2020YFA0714700);National Natural Science Foundation of China(Grant Nos.62274174,12274073);Key Research and Development Program of Jiangsu Province(Grant No.BK20232009);Cooperation Project of Vacuum Interconnect Research Facility(NANO-X)of Suzhou Institute of Nano-Tech and Nano-Bionics,Chinese Academy of Sciences(Grant No.F2208)。
The threshold voltage modulation of carbon nanotube thin-film transistors(TFTs)and flexible three-dimensional(3D)integration circuits has become hot research topics for carbon-based electronics.In this paper,a doping-...
supported in part by the National Key Research and Development Program of China under Grant 2022YFB3604400;in part by the Youth Innovation Promotion Association of Chinese Academy Sciences(CAS);in part by CAS-Croucher Funding Scheme under Grant CAS22801;in part by National Natural Science Foundation of China under Grant 62074161,Grant 62004213,and Grant U20A20208;in part by the Beijing Municipal Science and Technology Commission project under Grant Z201100008420009 and Grant Z211100007921018;in part by the University of CAS;in part by IMECAS-HKUST-Joint Laboratory of Microelectronics.
Enhancement-mode(E-mode)GaN-on-Si radio-frequency(RF)high-electron-mobility transistors(HEMTs)were fabri-cated on an ultrathin-barrier(UTB)AlGaN(<6 nm)/GaN heterostructure featuring a naturally depleted 2-D electron g...
Project supported by the Fundamental Research Funds for the National Key Research and Development Program, China (Grant No. 2020YFB1807403);the National Natural Science Foundation of China (Grant Nos. 62174125, 62188102, and 62131014)。
This paper reports a low-damage interface treatment process for Al N/Ga N high electron mobility transistor(HEMT)and demonstrates the excellent power characteristics of radio-frequency(RF) enhancementmode(E-mode) Al N...
supported by the Youth Innovation Promotion Association of the Chinese Academy of Sciences(Grant No.2020321);the National Natural Science Foundation of China(Grant No.92163204).
This letter showcases the successful fabrication of an enhancement-mode(E-mode)buried p-channel GaN fieldeffect-transistor on a standard p-GaN/AlGaN/GaN-on-Si power HEMT substrate.The transistor exhibits a threshold v...
This work was supported in part by the National Key Research and Development Program of China under Grant 2022YFB3604400;in part by the Youth Innovation Promotion Association of Chinese Academy Sciences(CAS);in part by CAS-Croucher Funding Scheme under Grant CAS22801;in part by National Natural Science Foundation of China under Grant 62074161,Grant 62004213,and Grant U20A20208;in part by the Beijing Municipal Science and Technology Commission project under Grant Z201100008420009 and Grant Z211100007921018;in part by the University of CAS;in part by IMECAS-HKUST-Joint Laboratory of Microelectronics.
In this letter,an enhancement-mode(E-mode)GaN p-channel field-effect transistor(p-FET)with a high current den-sity of−4.9 mA/mm based on a O_(3)-Al_(2)O_(3)/HfO_(2)(5/15 nm)stacked gate dielectric was demonstrated on ...
This work was supported in part by the Natural Science Foundation of China under Grant 62174019;in part by the Guangdong Basic and Applied Basic Research Foundation China under Grant 2021B1515140039;in part by the Zhuhai Industry-University Research Cooperation Project under Grant ZH22017001210041PWC.
In this work,the GaN p-MISFET with LPCVD-SiN_(x) is studied as a gate dielectric to improve device performance.By changing the Si/N stoichiometry of SiN_(x),it is found that the channel hole mobility can be effectivel...
supported in part by the National Basic Research Program of China(Grant No.2021YFB3600202);Key Laboratory Construction Project of Nanchang(Grant No.2020-NCZDSY-008);the Suzhou Science and Technology Foundation(Grant No.SYG202027)。
Power electronic devices are of great importance in modern society.After decades of development,Si power devices have approached their material limits with only incremental improvements and large conversion losses.As ...
the National Natural Science Foundation of China(Grant Nos.61974119,51602241,and 61834005);the Natural Science Foundation of Shannxi Province,China(Grant No.2020JM-532);the Science Foundation of Xi’an University of Science and Technology(Grant No.2018QDJ036).
A novel enhanced mode(E-mode)Ga_(2)O_(3) metal-oxide-semiconductor field-effect transistor(MOSFET)with vertical FINFET structure is proposed and the characteristics of that device are numerically investigated.It is fo...
supported by the Foundation of State Key Laboratory of Wide-Bandgap Semi-conductor Power Electronic Devices(No.2019KF001);National Natural Science Foundation of China(No.51677089)。
When using traditional drive circuits,the enhancement-mode GaN(eGaN)HEMT will be affected by high switching speed characteristics and parasitic parameters leading to worse crosstalk problems.Currently,the existing cro...
Project supported by the National Key Research and Development Program of China(Grant No.2020YFB1804902);the National Natural Science Foundation of China(Grant No.61904135);the China Postdoctoral Science Foundation(Grant Nos.2018M640957 and BX20200262);the Natural Science Foundation of Shaanxi Province,China(Grant No.2020JQ-316).
Ultra-thin barrier(UTB) 4-nm-Al Ga N/Ga N normally-off high electron mobility transistors(HEMTs) having a high current gain cut-off frequency( fT) are demonstrated by the stress-engineered compressive Si N trench tech...