This paper presents a literature review exploring the potential of piezoelectric field-effect transistors(piezo-FETs)as bionic microelectromechanical systems(MEMS).First,piezo-FETs are introduced as bionic counterpart...
financially supported by the National Natural Science Foundation of China(No.12174444);M.Zhu acknowledges the fruitful discussion with Dr.Jinbao Jiang at National University of Defense Technology.
High-performance field-effect transistors (FETs) based on atomically thin two-dimensional (2D) semiconductors have demonstrated great promise in post-Moore integrated circuits. However, unipolar p-type 2D semiconducto...
supported by National Natural Science Foundation of China(Grant No.61874029)。
Recently,the oxide semiconductor-based 2T0C dynamic random-access memory(DRAM)has shown great potential in monolithic three-dimensional(M3D)-integrated memory,owing to some unique advantages of oxide semiconductors,su...
supported by National Natural Science Foundation of China(Grant Nos.61925402,62090032,62004040);National Key Research and Development Program(Grant No.2021YFA1200500);Innovation Program of Shanghai Municipal Education Commission(Grant No.2021-01-07-00-07-E00077);Science and Technology Commission of Shanghai Municipality(Grant No.19JC1416600);Shanghai Pilot Program for Basic Research–Fudan University(Grant No.21TQ1400100(21TQ011));Shanghai Rising-Star Program(Grant No.22QA1400700);the Young Scientist Project of MOE Innovation Platform。
Semimetallic bismuth(Bi)is one of the most effective strategies for reducing the contact resistance of two-dimensional transition metal dichalcogenide field effect transistors(FETs).However,the low melting point of Bi...
support from the National Natural Science Foundation of China(Nos.62004128 and 61874074);the Fundamental Research Foundation of Shenzhen(No.JCYJ20190808152607389);the Science and Technology Project of Shenzhen(No.JCYJ20220531100815034);H.N.L.acknowledges the Guangdong Basic and Applied Basic Research Foundation(No.2022A1515012055).
The discovery of two-dimensional(2D)semiconductor has opened up new avenues for the development of short-channel field-effect transistors(FETs)with desired electrical performance.Among them,orthorhombic tin-selenide(S...
supported by National Key Research and Development Project(Grant No.2018YFB2200500);National Natural Science Foundation of China(Grant Nos.62025402,62090033,91964202);Major Scientific Research Project of Zhejiang Lab(Grant No.2021MD0AC01);Zhejiang Province Key R&D Programs(Grant Nos.2022C01232,2021C05004)。
The steep subthreshold swing(SS)could be achieved in negative capacitance field-effect transistors(NCFET)to reduce power dissipation in modern electronics.Polycrystalline Hf O2-based ferroelectric materials have attra...
supported in part by National Key R&D Program(Grant No.2018YFA0208503);National Natural Science Foundation of China(Grant Nos.92264204,61890944);China Postdoctoral Science Foundation(Grant No.2021M703444)。
In the past several decades,the density and performance of transistors in a single chip have been increasing based on Moore's Law.However,the slowdown of feature size reduction and memory wall in the von Neumann archi...
This work was supported in part by the National Key Research and Development Program of China under Grant 2022YFB3604400;in part by the Youth Innovation Promotion Association of Chinese Academy Sciences(CAS);in part by CAS-Croucher Funding Scheme under Grant CAS22801;in part by National Natural Science Foundation of China under Grant 62074161,Grant 62004213,and Grant U20A20208;in part by the Beijing Municipal Science and Technology Commission project under Grant Z201100008420009 and Grant Z211100007921018;in part by the University of CAS;in part by IMECAS-HKUST-Joint Laboratory of Microelectronics.
In this letter,an enhancement-mode(E-mode)GaN p-channel field-effect transistor(p-FET)with a high current den-sity of−4.9 mA/mm based on a O_(3)-Al_(2)O_(3)/HfO_(2)(5/15 nm)stacked gate dielectric was demonstrated on ...
supported by the Fundamental Strengthening Program Key Basic Research Project(Grant No.2021-173ZD-057).
A NiO/β-Ga_(2)O_(3) heterojunction-gate field effect transistor(HJ-FET)is fabricated and it_(s)instability mechanisms are exper-imentally investigated under different gate stress voltage(V_(G,s))and stress times(t_(s...
supported in part by the National Basic Research Program of China(Grant No.2021YFB3600202);Key Laboratory Construction Project of Nanchang(Grant No.2020-NCZDSY-008);the Suzhou Science and Technology Foundation(Grant No.SYG202027)。
Power electronic devices are of great importance in modern society.After decades of development,Si power devices have approached their material limits with only incremental improvements and large conversion losses.As ...