云南高校图书馆联盟文献共享服务平台- Journal of Microelectronic Manufacturing

《Journal of Microelectronic Manufacturing》: 作品数：66被引量：17H指数：2; 导出分析报告; 主办单位：中国科学院微电子研究所; 最新期次：2021年4期更多>>; 发文主题：LITHOGRAPHYINDUSTRYMETROLOGYIN_CHINAMASK更多>>; 发文领域：电子电信自动化与计算机技术经济管理理学更多>>; 发文基金：国家自然科学基金国家重点基础研究发展计划广东省自然科学基金更多>>

Influence of Parameters in the Design of a Faceted Structure for Incoherent Beam Shaping: 《Journal of Microelectronic Manufacturing》2021年第4期1-11,共11页Lihong Liu Thierry Engel- Huwen Ding Yuanzhi Cui Jing Zhang Yayi Wei Manuel Flury; supported by Natural Science Foundation of Shandong Province,China(No.ZR2019BF033).; A reflective faceted structure is proposed to reshaping an incoherent light beam into two focalized spots-To obtain the desired irradiance distribution on a detector,custom optimization function is written,and the two...; 关键词：Incoherent beam shaping micro lens array custom optimization

A Novel R2R Control Strategy with Virtual Structure Deployment and Rolling Wave Control Plan: 《Journal of Microelectronic Manufacturing》2021年第3期1-6,共6页Chang Xu; supported by my department manager Haw-Jyue Luo for gently sharing his years of semiconductor manufacturing experience.; This paper presents an innovative R2R(run to run)control strategy.This novel approach has made use of circuit design structure through virtually put up the structure before reach the actual structure developing step.T...; 关键词：R2R MANUFACTURING control circuit design virtual metrology

New Progress of China's EDA Industry: 《Journal of Microelectronic Manufacturing》2021年第3期7-10,共4页; China's IC industry has been flourishing in recent years,huge market demand together with government investments are the major driving forces for this development.The status and development momentum of the Chinese IC ...; 关键词：mutual driving INDUSTRY

Improvement of Environment Stability of an i-Line Chemically Amplified Photoresist: 《Journal of Microelectronic Manufacturing》2021年第2期1-7,共7页Haibo Li Qian Yang Jia Sun Jie Li Meng Guo Bing Li; An i-Line chemically amplified(ICA)thick film positive resist is reported in this paper.The impact of process conditions on photoresist performance was investigated.Pre-apply bake temperature and post exposure bake te...; 关键词：Chemical amplification thick film i-Line environment stability Poly(p-hydroxyl styrene) PAB PEB

Patterning with Organized Molecules: 《Journal of Microelectronic Manufacturing》2021年第2期8-11,共4页Mark Neisser; Decades of progress in the semiconductor industry has led to lithographically printed dimensions that are small enough that the positions of individual molecules and the stochastic variation in the number of photons h...; 关键词：Stochastics Self-assembly OVERLAY edge placement error SELF-ORGANIZING DNA origami bottle brush polymers

New Progress of China's Integrated Circuit Design Industry: 《Journal of Microelectronic Manufacturing》2021年第2期12-18,共7页; Editorial Introduction:China's IC industry has been flourishing in recent years,huge market demand together with government investments are the major driving forces for this development.The status and development mome...; 关键词：mutual driving INDUSTRY

Recent Advances in Organic-inorganic Hybrid Photoresists被引量：2: 《Journal of Microelectronic Manufacturing》2021年第1期1-15,共15页Zhihao Wang Xindi Yao Huiwen An Yake Wang Jinping Chen Shuangqing Wang Xudong Guo Tianjun Yu Yi Zeng Guoqiang Yang Yi Li; Financial support from the National Natural Science Foundation of China(22090012,U20A20144,21873106,22073108 and 21903085);the Ministry of Science and Technology of China Major Project(2018ZX02102005,2011ZX02701)is gratefully acknowledged.; Photoresists are radiation-sensitive materials used for forming patterns to build up IC devices.To date,most photoresists have been based on organic polymers,which have been dominating the semiconductor industries ove...; 关键词：Organic-inorganic hybrid photoresist EUV lithography NANOCLUSTER NANOPARTICLE organometallic complex

Fast and Robust DCNN Based Lithography SEM Image Contour Extraction Models: 《Journal of Microelectronic Manufacturing》2021年第1期16-22,共7页Tao Zhou Xuelong Shi Chen Li Yan Yan Bowen Xu Shoumian Chen Yuhang Zhao Wenzhan Zhou Kan Zhou Xuan Zeng; Scanning electron microscope(SEM)metrology is critical in semiconductor manufacturing for patterning process quality assessment and monitoring.Besides feature width and feature-feature space dimension measurements fro...; 关键词：SEM images contour extraction machine leaning(ML) deep convolution neural network(DCNN) edge placement variation

Recent Progress of the Integrated Circuit Industry in China——Overview of the Special Equipment: 《Journal of Microelectronic Manufacturing》2021年第1期23-32,共10页; China's IC industry has been flourishing in recent years,huge market demand together with government investments are the major driving forces for this development.The status and development momentum of the Chinese IC ...; 关键词：mutual driving INDUSTRY

Nano-Electronic Simulation Software (NESS): A Novel Open-Source TCAD Simulation Environment: 《Journal of Microelectronic Manufacturing》2020年第4期21-31,共11页Cristina Medina-Bailon Tapas Dutta Fikru Adamu-Lema Ali Rezaei Daniel Nagy Vihar P.Georgiev Asen Asenov; the European Union Horizon 2020 research and innovation programme under grant agreement No.688101 SUPERAID7 and has received further funding from EPSRC UKRI Innovation Fellowship scheme under grant agreement No.EP/S001131/1(QSEE),No.EP/P009972/1(QUANTDEVMOD)and No.EP/S000259/1(Variability PDK for design based research on FPGA/neuro computing);and from H2020-FETOPEN-2019 scheme under grant agreement No.862539-Electromed-FET OPEN.; This paper presents the latest status of the open source advanced TCAD simulator called Nano-Electronic Simulation Software(NESS)which is currently under development at the Device Modeling Group of the University of G...; 关键词：Integrated Simulation Environment VARIABILITY DRIFT-DIFFUSION Quantum Correction Kubo-Greenwood Non-Equilibrium Green’s Function

《Journal of Microelectronic Manufacturing》