the Science and Technology Program of Beijing Municipal Science and Technology Commission,China(Grant No.Z201100004220001);the National Major Project of Science and Technology of China(Grant No.2017ZX02315001);the Opening Project of Key Laboratory of Microelectronic Devices&Integrated Technology,Institute of Microelectronics,Chinese Academy of Sciences(Grant Nos.Y9YS05X002 and E0YS01X001).
A comprehensive study of the negative and positive bias temperature instability(NBTI/PBTI)of 3D FinFET devices with different small channel lengths is presented.It is found while with the channel lengths shrinking fro...
Project supported by the National Natural Science Foundation of China(Grant No.61634008).
The influence of positive bias temperature instability(PBTI)on 1/f noise performance is systematically investigated on n-channel fin field-effect transistor(FinFET).The FinFET with long and short channel(L=240 nm,16 n...
Project supported by the National Key Research and Development Program,China(Grant No.2017YFB0402800);the Key Research and Development Program of Guangdong Province,China(Grant No.2019B010128002);the National Natural Science Foundation of China(Grant No.U1601210);the Natural Science Foundation of Guangdong Province,China(Grant No.2015A030312011)。
The effect of high overdrive voltage on the positive bias temperature instability(PBTI)trapping behavior is investigated for GaN metal–insulator–semiconductor high electron mobility transistor(MIS-HEMT)with LPCVD-Si...
Project supported by the National High Technology Research and Development Program of China(Grant No.SS2015AA010601);the National Natural Science Foundation of China(Grant Nos.61176091 and 61306129)
The positive bias temperature instability(PBTI) degradations of high-k/metal gate(HK/MG) n MOSFETs with thin TiN capping layers(1.4 nm and 2.4 nm) are systemically investigated. In this paper, the trap energy di...
Project supported by the National Natural Science Foundation of China (Grant No 60206006), the Program for New Century Excellent Talents of Ministry of Education of China (Grant No 681231366), the National Defense Pre-Research Foundation of China (Grant No 51308040103) and the Key Project of Chinese Ministry of Education (Grant No 104172).
Degradation characteristics of PMOSFETs under negative bias temperature-positive bias temperature-negative bias temperature (NBT-PBT-NBT) stress conditions are investigated in this paper. It is found that for all de...