the Science and Technology Program of Beijing Municipal Science and Technology Commission,China(Grant No.Z201100004220001);the National Major Project of Science and Technology of China(Grant No.2017ZX02315001);the Opening Project of Key Laboratory of Microelectronic Devices&Integrated Technology,Institute of Microelectronics,Chinese Academy of Sciences(Grant Nos.Y9YS05X002 and E0YS01X001).
A comprehensive study of the negative and positive bias temperature instability(NBTI/PBTI)of 3D FinFET devices with different small channel lengths is presented.It is found while with the channel lengths shrinking fro...
Project supported by the National Natural Science Foundation of China(Grant No.61634008).
The influence of positive bias temperature instability(PBTI)on 1/f noise performance is systematically investigated on n-channel fin field-effect transistor(FinFET).The FinFET with long and short channel(L=240 nm,16 n...
Project supported by the National Key Research and Development Program,China(Grant No.2017YFB0402800);the Key Research and Development Program of Guangdong Province,China(Grant No.2019B010128002);the National Natural Science Foundation of China(Grant No.U1601210);the Natural Science Foundation of Guangdong Province,China(Grant No.2015A030312011)。
The effect of high overdrive voltage on the positive bias temperature instability(PBTI)trapping behavior is investigated for GaN metal–insulator–semiconductor high electron mobility transistor(MIS-HEMT)with LPCVD-Si...
financially supported by National Key Project of Science and Technology of China(Grant Nos.2017ZX02315001-002,2019ZX02303).
Dear editor,High k/metal gate(HKMG)stacks with fully gatelast processing have become the primary solution for sub-22-nm volume manufacturing with the development of complementary oxide semiconductor(CMOS)technology[1]...
Incorporation of Te and Gd were done based on the stoicheometric formula PbTi_(0.8-x)Te_(0.2)Gd_(x)O_(3)(PTTeG).TG characterization of green powder revealed the completion of solid state reaction at temperature 450℃....
针对传统反应扩散(reaction-diffusion,R-D)机制不适合纳米互补金属氧化物半导体(complementary metal oxide semiconductor,CMOS)集成电路正偏置温度不稳定性(positive bias temperature instability,PBTI)老化效应分析的问题,文章采...