Microelectronic magnetic sensors are essential in diverse applications,including automotive,industrial,and consumer electronics.Hall-effect devices hold the largest share of the magnetic sensor market,and they are par...
A surface modification of diamond with manganese powder was attempted to make a magnetic functional surface for handling diamond. Manganese carbide, Mn7C3, was formed on diamond (110) by near-infrared radiation heatin...
Project supported by the National Natural Science Foundation of China(Grant Nos.61273063 and 61503321);the China Postdoctoral Science Foundation(Grant No.2013M540215);the Natural Science Foundation of Hebei Province,China(Grant No.F2014203161);the Youth Research Program of Yanshan University,China(Grant No.02000134)
Transcranial Hall-effect stimulation(THS) is a new stimulation method in which an ultrasonic wave in a static magnetic field generates an electric field in an area of interest such as in the brain to modulate neuron...
Supported by the National Natural Science Foundation of China (Grant No.10574148);the National High-Tech Research and Development Program of China (Grant Nos. 2006AA03A106 and 2006AA03A107);the National Basic Research Program of China (Grant No. 2006CB921300)
Al x Ga 1-x N/GaN high-electron-mobility transistor (HEMT) structures with Al composition ranging from x = 0.13 to 0.36 are grown on sapphire substrates by low-pressure metalorganic chemical vapor deposition (LP-MOCVD...
supported by National Natural Science Foundation of China(No.50676026)
A new method to measure the average plasma velocity in a Hall-effect thruster is presented. The method is brought forward in virtue of the characteristics of low frequency oscillation induced by the propellant ionizat...
supported by National Natural Science Foundation of China (No. 50676026)
Effect of the hollow cathode heat power on the performance of a Hall-effect thruster is investigated. The variations in the Hall-effect thruster's performance (thrust, specific impulse and anode efficiency) with th...
the National Basic Research Program of China (Grant No. 2006CB6049);the National Hi-Tech Research and Development Program of China (Grant No. 2006AA03A142);the National Natural Science Foundation of China (Grant Nos. 60721063, 60731160628 and 60676057);the Research Fund for the Doctoral Program of Higher Education of China (Grant No. 20050284004) ;the Natural Science Foundation of Jiangsu Province of China (Grant No. BK2005210)
The surface morphology,electrical properties and optical properties of Si doped n-type GaN were investigated. The intentional SiH4 doped GaN films were grown by metal organic chemical vapor deposition with the electro...