POLISHING

作品数：210被引量：349H指数：10
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相关领域：金属学及工艺更多>>
相关作者：辛企明康仁科霍凤伟金洙吉赵福令更多>>
相关机构：大连理工大学东华大学北京理工大学南昌大学更多>>
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相关基金：国家自然科学基金国家重点基础研究发展计划广东省自然科学基金河北省自然科学基金更多>>
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  • 期刊=Chinese Physics Lettersx
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Indium Tin Oxide Coated D-Shape Fiber as a Saturable Absorber for Generating a Dark Pulse Mode-Locked Laser
《Chinese Physics Letters》2020年第5期51-54,共4页B.Nizamani S.Salam A.A.A.Jafry N.M.Zahir N.Jurami M.I.M.Abdul Khudus A.Shuhaimi E.Hanafi S.W.Harun 
Ministry of Education of Malaysia(Grant No.LR001A-2016A);University of Malaya(Grant No.RP039C-18AFR)。
A dark pulse mode-locked laser is experimentally demonstrated using the indium tin oxide(ITO)coated Dshape fiber as a saturable absorber(SA).Using the polishing wheel technique,a D-shape single mode fiber was fabricat...
关键词：FIBER POLISHING mode 
Effect of Cations on the Chemical Mechanical Polishing of SiO_(2) Film被引量：1
《Chinese Physics Letters》2013年第9期173-176,共4页SONG Han WANG Liang-Yong LIU Wei-Li SONG Zhi-Tang 
Supported by the National Integrate Circuit Research Program of China(2011ZX02704-002,2009ZX02030-001);the National Natural Science Foundation of China(51205387);Science and Technology Council of Shanghai(11nm0500300,10QB1403600).
We investigate the effect of cations with different valences on the chemical mechanical polishing(CMP)of silicon dioxide films.The removal rate and surface roughness of the silicon-dioxide-film post-CMP are checked fo...
关键词：POLISHING ROUGHNESS dioxide 
Development of Vertical Buffered Electropolishing for Its Post-Treatment Technology on 1.5GHz Niobium SRF Cavities
《Chinese Physics Letters》2011年第11期91-94,共4页JIN Song ATWu LU Xiang-Yang RARimmer LIN Lin ZHAO Kui 
We report the latest research development of vertical buffered electropolishing on its post-treatment procedure as well as the effects of several major post-treatment techniques for buffered electropolishing(BEP)proce...
关键词：treatment POLISHING cavity 
Behaviour of Self-Standing CVD Diamond Film with Different Dominant Crystalline Surfaces in Thermal-Iron Plate Polishing
《Chinese Physics Letters》2006年第8期2266-2268,共3页陈广超 周祖源 李彬 周有良 李成明 唐伟忠 佟玉梅 吕反修 
Supported by the National High Technology Development Programme of China under Grant No 2002AA305508, the National Natural Science Foundation of China under Grant No 50472095, the Scientific Research Foundation （SRF） for the Returned 0verseas Chinese Scholars （R0CS）, State Education Ministry （2003-14）, the Beijing Novel Project （No 2003A13）, and the Beijing Natural Science Foundation under Grant No 2062015.
Self-standing CVD diamond films with different dominant crystalline surfaces are polished by the thermal-iron plate polishing method. The influence of the dominant crystalline surfaces on polishing etfficiency is inve...
关键词：MICROWAVE-PLASMA GRAPHITIZATION 
Metalorganic Chemical Vapor Deposition of GaAs on Si Substrate Prepared by Room Temperature Chemical Cleaning Treatment
《Chinese Physics Letters》1997年第9期690-693,共4页YIN Min LOU Li-ren FU Zhu-xi 
Supported by the National Natural Science Foundation of China under Grant No.8688601.
A new method for metalorganic chemical vapor deposition(MOCVD)of GaAs on Si substrates is developed.Instead of the usual high temperature surface cleaning treatment for Si substrate,the new method uses room temperatur...
关键词：MOCVD POLISHING MIRROR 
Silicon-on-Insulator 2×2 Symmetric Optical Switch Based on Total Internal Reflection
《Chinese Physics Letters》1997年第2期106-108,共3页ZHAO Ce-zhou LIU En-ke LI Guo-zheng LIU Yu-liang GUO Lin 
Supported by the High Technology Research and Development Programme of China.
Based on the large cross-section single-mode rib waveguide condition,the total internal reflection and the free-carrier plasma dispersion effect,a silicon-on-insulator(SOI)2×2 symmetric optical waveguide switch with ...
关键词：WAVEGUIDE SOI POLISHING 
THE MECHANISM OF SURFACE SEGREGATION BY THE METHOD OF MECHANICAL POLISHING
《Chinese Physics Letters》1986年第3期129-132,共4页CHEN Naiqun ZHANG Qianq-ii HUA Zhongyi 
Mechanical polishing and subsequent thermal oxidation are the indispensable condition for rapid formation of a continuous and highly Cr-enriched layer on the surface of a Ni-Cr alldy.Direct observations of the Cr dist...
关键词：GRAIN POLISHING SURFACE 
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