the National Key Research and Development Program of China(Grant No.2018YFB2200500);the National Natural Science Foundation(Grant Nos.62050073,62090054,61975196).
Beta-gallium oxide(β-Ga_(2)O_(3))thin films were deposited on c-plane(0001)sapphire substrates with different mis-cut angles along<>by metal-organic chemical vapor deposition(MOCVD).The structural properties and surf...
The heteroepitaxy of semiconductor thin films is a cornerstone of semiconductor devices and is naturally preferred to grow on matched substrates from the view point of material epitaxy. However, the heteroepitaxy is a...
Single crystalline 3C-SiC epitaxial layers are grown on φ 50mm Si wafers by a new resistively heated CVD/LPCVD system,using SiH_4,C_2H_4 and H_2 as gas precursors.X-ray diffraction and Raman scattering measurements a...