HOT-CARRIER

作品数:18被引量:14H指数:3
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相关领域:电子电信更多>>
相关作者:刘斯扬钱钦松孙伟锋王金延张兴更多>>
相关机构:北京大学东南大学西安电子科技大学更多>>
相关期刊:《InfoMat》《Chinese Physics B》《npj Computational Materials》《Journal of Electronics(China)》更多>>
相关基金:国家自然科学基金国家重点基础研究发展计划更多>>
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Hot-carrier-induced on-resistance degradation of step gate oxide NLDMOS
《Journal of Semiconductors》2010年第12期49-53,共5页韩雁 张斌 丁扣宝 张世峰 韩成功 胡佳贤 朱大中 
Project supported by the National Science & Technology Major Project of China(No.2009ZX01033-001-003)
The hot-carrier-induced on-resistance degradations of step gate oxide NLDMOS (SG-NLDMOS) transistors are investigated in detail by a DC voltage stress experiment, a TCAD simulation and a charge pumping test. For dif...
关键词:SG-NLDMOS Ron degradation charge-pumping interface state positive oxide-trapped charge 
Research into charge pumping method technique for hot-carrier degradation measurement of LDMOS
《Journal of Semiconductors》2009年第10期46-50,共5页钱钦松 刘斯扬 孙伟锋 时龙兴 
supported by the Jiangsu Provincial Natural Science Foundation(No.BK2008287)
A measuring technique based on the CP(charge pumping)method for hot-carrier degradation measurement of high voltage N-LDMOS is researched in depth.The impact of the special configuration on the CP spectrum and the g...
关键词:CP measurements N-LDMOS HOT-CARRIER interface states 
An Improved Method to Extract Generation of Interface Trap in Hot-Carrier-Stressed LDD n-MOSFET
《Journal of Semiconductors》2003年第8期803-808,共6页杨国勇 毛凌锋 王金延 霍宗亮 王子欧 许铭真 谭长华 
国家重点基础研究发展规划资助项目(No.G2 0 0 0 0 3 65 0 3 )~~
A new improved technique,based on the direct current current voltage and charge pumping methods,is proposed for measurements of interface traps density in the channel and the drain region for LDD n MOSFET.This tech...
关键词:hot  carrier stress LDD ultra  thin gate oxide two step degradation 
Channel Hot-Carrier-Induced Breakdown of PDSOI NMOSFET's
《Journal of Semiconductors》2001年第8期1038-1043,共6页刘红侠 郝跃 朱建纲 
中国国家先进研究基金资助项目 (批准号 :982 5 741)
The hot-carrier-induced oxide breakdown i s systematically clarified for partially depleted SOI NMOSFET's fabricated on SI MOX wafer.The gate oxide properties are considered to analyze the channel hot-c arrier effects...
关键词:Hot-Carrier Effects (HCE) device lifetime SOI  NMOSFET's SIMOX 
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