supported by National Key Research and Development Program under Grant No.2022YFB3607100;Shenzhen Research Programs under Grant Nos.JCYJ20200109140601691,JCYJ20190808154803565,SGDX20201103095607022,SGDX20211123145404006,and GXWD20201231165807007-20200807025846001。
As growing applications demand higher driving currents of oxide semiconductor thin-film transistors(TFTs),severe instabilities and even hard breakdown under high-current stress(HCS)become critical challenges.In this w...
Project supported by the National Natural Science Foundation of China(Grant Nos.51771144 and 62104189);the Natural Science Foundation of Shaanxi Province,China(Grant Nos.2021JC-06,2019TD-020,and 2019JLM-30);the China Postdoctoral Science Foundation(Grant No.2020M683483);the Fundamental scientific research business expenses of Xi'an Jiaotong University(Grant No.XZY022020017).
Amorphous indium-gallium-zinc oxide(a-IGZO)thin films are prepared by pulsed laser deposition and fabricated into thin-film transistor(TFT)devices.In-situ x-ray photoelectron spectroscopy(XPS)illustrates that weakly b...
Project supported by the National Natural Science Foundation of China(Grant Nos.61971299 and 61974101);the Natural Science Foundation of Jiangsu Province of China(Grant No.BK20201201);the Fund from Suzhou Science and Technology Bureau(Grant No.SYG201933);the Fund from the State Key Laboratory of ASIC and System,Fudan University,(Grant No.2021KF005)。
Degradation of a-InGaZnO thin-film transistors working under simultaneous DC gate and drain bias stress is investigated,and the corresponding degradation mechanism is proposed and verified.The maximum degradation occu...