LDMOST

作品数:13被引量:6H指数:2
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相关领域:电子电信更多>>
相关作者:罗晋生唐本奇熊平高玉民卢豫曾更多>>
相关机构:电子科技大学西安交通大学西北核技术研究所中北大学更多>>
相关期刊:《固体电子学研究与进展》《Journal of Semiconductors》《微电子学》《Chinese Physics B》更多>>
相关基金:国家自然科学基金中国博士后科学基金江苏省自然科学基金更多>>
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An improved SOI trench LDMOST with double vertical high-k insulator pillars
《Journal of Semiconductors》2018年第9期61-66,共6页Huan Li Haimeng Huang Xingbi Chen 
supported by the National Natural Science Foundation of China(Nos.51237001,51607026);the Fundamental Research Funds for the Central Universities(No.ZYGX2016J048)
An SOI trench LDMOST(TLDMOST)with ultra-low specific on-resistanceis proposed.It features double vertical high-k insulator pillars(Hk1 and Hk2)in the oxide trench,which are connected to the source electrode and dr...
关键词:breakdown voltage HIGH-K specific on-resistance trench LDMOST 
Electric field optimized LDMOST using multiple decrescent and reverse charge regions
《Journal of Semiconductors》2014年第7期65-68,共4页成建兵 夏晓娟 蹇彤 郭宇峰 于舒娟 杨浩 
supported by the National Natural Science Foundation of China(No.61274080);the Natural Science Foundation of Jiangsu Province(No.BK2011753);the Postdoctoral Science Foundation of China(No.2013M541585)
A lateral double-diffused metal-oxide-semiconductor field effect transistor (LDMOST) with multiple n-regions in the p-substrate is investigated in detail. Because of the decrescent n-regions, the electric field dist...
关键词:LDMOST multiple decrescent and reverse charge regions electric field breakdown voltage ON-RESISTANCE 
New Lateral Super Junction MOSFETs with n^+-Floating Layer on High-Resistance Substrate被引量:2
《Journal of Semiconductors》2007年第2期166-170,共5页段宝兴 张波 李肇基 
国家自然科学基金资助项目(批准号:60436030,60576052)~~
A new super junction LDMOST structure that suppresses the substrate-assisted depletion effect is designed with an n^+-floating layer embedded in the high-resistance p-type substrate by implanting phosphor or arsenic....
关键词:super junction LDMOST substrate-assisted depletion n^+-floating layer breakdown voltage 
LDMOS晶体管新型器件结构的耐压分析被引量:3
《Journal of Semiconductors》1999年第9期776-779,共4页唐本奇 罗晋生 耿斌 李国政 
本文提出了一种新型的内置FR/JTE横向DMOS结构,并对其进行了耐压分析,结果表明,该结构具有与RESURF器件相媲美的击穿电压,并且工艺简单,受工艺参数波动的影响较小,相对于内场限环结构,其耐压高且导通电阻低。
关键词:LDMOS晶体管 结构 LDMOST 耐压分析 
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