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Project supported by the National Natural Science Foundation of China(Grant No.62104185);the Fundamental Research Funds for the Central Universities,China(Grant No.JB211103);the National Natural Science Foundation for Distinguished Young Scholars,China(Grant No.61925404);the Wuhu and Xidian University Special Fund for Industry–University-Research Cooperation,China(Grant No.XWYCXY-012021010)。
Dynamic characteristics of the single-crystal Ga N-passivated lateral AlGaN/GaN Schottky barrier diodes(SBDs)treated with proton irradiation are investigated.Radiation-induced changes including idealized Schottky inte...
supported in part by Key Project of Shanghai Science and Technology Committee(18DZ1100303).
The construction of integrated energy systems can help improve energy efficiency and promote global energy transi-tion.However,in recent years,the occurrence of extreme natural disasters has brought certain threats to...
supported by the MSIT(Ministry of Science and ICT),Korea,under the ITRC(Information Technology Research Center)support program(IITP-2020-2018-0-01421)supervised by the IITP(Institute for Information&communications Technology Promotion);then Samsung Electronics.
A split gate MOSFET(SG-MOSFET)is widely known for reducing the reverse transfer capacitance(C_(RSS)).In a 3.3 kV class,the SG-MOSFET does not provide reliable operation due to the high gate oxide electric field.In add...
supported by the National Science and Technology Major Project(No.2017YFB0102302)。
A 4H-SiC power MOSFET with specific on-resistance of 3.4 mΩ·cm^2 and breakdown voltage exceeding 1.5 kV is designed and fabricated.Numerical simulations are carried out to optimize the electric field strength in gat...
financially supported by the Research Program Funds of Jilin University (Nos.419080500665 and 451170301076);the Natural Science Foundation of Shandong Province (No.ZR2015EM036)
Despite the fact that numerous infection-resistant surfaces have been developed to prevent bacterial colonization and biofilm formation, developing a stable, highly antibacterial and easily produced surface remains a ...
Project supported by the Guangxi Natural Science Foundation of China(No.2013GXNSFAA019335);the Guangxi Department of Education Project(No.201202ZD041);the China Postdoctoral Science Foundation Project(Nos.2012M521127,2013T60566);the National Natural Science Foundation of China(Nos.61361011,61274077,61464003)
A new high-voltage LDMOS with linearly-distanced fixed charge islands is proposed (LFI LDMOS). A lot of linearly-distanced fixed charge islands are introduced by implanting the Cs or I ion into the buried oxide laye...
supported by the National Natural Science Foundation of China(No.61274080);the Natural Science Foundation of Jiangsu Province(No.BK2011753);the Postdoctoral Science Foundation of China(No.2013M541585)
A lateral double-diffused metal-oxide-semiconductor field effect transistor (LDMOST) with multiple n-regions in the p-substrate is investigated in detail. Because of the decrescent n-regions, the electric field dist...
Project supported by the National Science and Technology Project of the Ministry of Science and Technology of China(Grant No.2010ZX02201);the National Natural Science Foundation of China(Grant No.61176069);the National Defense Pre-Research of China(Grant No.51308020304)
A novel low specific on-resistance (Ron,sp) lateral double-diffused metal oxide semiconductor (LDMOS) with a buried improved super-junction (BISJ) layer is proposed. A super-junction layer is buried in the drift...
Project supported by the National Natural Science Foundation of China(No.61176069);the Program for New Century Excellent Talentsin University of Ministry of Education of China(No.NCET-11-0062);the China Postdoctoral Science Foundation(No.2012T50771)
A low specific on-resistance(R on;sp/ SOI NBL TLDMOS(silicon-on-insulator trench LDMOS with an N buried layer) is proposed. It has three features: a thin N buried layer(NBL) on the interface of the SOI layer/bur...
supported by the National Natural Science Foundation of China (Grant No. 61176069);the State Key Laboratory Science Fund of Electronic Thin Films and Integrated Devices of China (Grant No. CXJJ201004);the National Key Laboratory Science Fund of Analog Integrated Circuit,China (Grant No. 9140C090304110C0905)
A novel low specific on-resistance (Ron,sp) silicon-on-insulator (SO1) p-channel lateral double-diffused metal-oxide semiconductor (pLDMOS) compatible with high voltage (HV) n-channel LDMOS (nLDMOS) is propo...