The epitaxial techniques are the most important processes in the production of semiconductor materials and optoelectronic devices. Liquid phase epitaxy (LPE) and metal organic vapor phase epitaxy (MOVPE) particularly...
Growth of GaInAsSb epilayer by liquid phase epitaxy (LPE) was reported. The LPE system with a hor-izontal sliding graphite boat was employed. The Te-doped (100) GaSb wafer was chosen as substrate. Thephysical properti...
The processing of InP, GaAs and related compounds doped with rare earth metals, such as Er, Nd and Gd, grown by LPE is described. The inhomogeneity of rare earth heavily doped epi-layers is studied by SIMS, SEM and X-...
The LPE growth of quaternary InAs11-x-yPxSby with x = 0.2 and y = 0.09 on InAs substrate has been studied. This composition is very suitable for the laser and detector applications at about 2.5 μm. We show that in In...
Five kinds of InGaAsP/InP heterostructure materials grown with LPE have been measured by means of Auger electron analysis, X-ray double-crystal diffraction, selective etching and surface morphology analysis. The relat...