图形化蓝宝石衬底工艺研究进展  

Study Progress of the Manufacturing Process of Patterned Sapphire Substrates

作　　者：黄成强[1] 夏洋[1] 陈波[1] 李超波[1] 万军[2] 汪明刚[1] 饶志鹏[1] 李楠[1] 张祥[1] 

机构地区：[1]中国科学院微电子研究所,北京100029 [2]中国科学院嘉兴微电子仪器与设备工程中心,浙江嘉兴314000

出　　处：《半导体技术》2012年第7期497-503,581,共8页Semiconductor Technology

基　　金：国家自然科学基金资助项目(60727003)

摘　　要：图形化蓝宝石衬底(PSS)技术是一种提高LED亮度的新技术。结合光刻和刻蚀工艺制作图形化蓝宝石衬底。有关图形化蓝宝石衬底的研究主要集中在对光刻和刻蚀工艺的研究,以及图形化蓝宝石衬底提高LED亮度的机理。目前微米级图形化蓝宝石衬底已经得到普遍的应用,与基于平坦蓝宝石衬底的LED相比,PSS-LED的发光功率提高了30%左右。图形化蓝宝石衬底技术的发展经历了从早期的条纹状图形到目前应用较广的半球形和锥形图形,从湿法刻蚀到干法刻蚀,从微米级到纳米级图形的演变。由于能够显著提高LED亮度,纳米级图形化蓝宝石必将得到广泛的运用。Patterned sapphire substrate （PSS） can significantly enhance the brightness of the LED. The PSS is made through the combination of photolithography and etching. The study on PSS mainly focuses on photolithography, etching and the mechanism of brightness enhancement by PSS. At present, micro-scale PSS-LED showed 30% higher luminous power than a flat substrate LED and the micro-scale PSS was applied in common. The development of PSS technology has experienced from striated pattern to hemispherical and cone-shaped pattern, from wet etching to dry etching, from microscale to nano-scale. For the excellent effect on the brightness, nano-scale PSS will be widely applied.

关 键 词：图形化蓝宝石衬底 发光二极管 光刻 纳米压印 刻蚀 

分 类 号：TN364.2[电子电信—物理电子学]