The influence of ^(60)Co(γ-ray)irradiation on the electrical characteristics of Al/Si_(3)N_(4)/p-Si(MIS)structures is investigated using capacitance-voltage(C–V)and conductance-voltage(G/ω–V)measurements.The MIS s...
An Al/SiO_(2)/p-Si(MOS)capacitor with a thick(826Å)interfacial oxide layer(SiO_(2))which is formed by using the thermal oxidation method is fabricated to investigate both frequency and applied bias voltage dependences...
Supported by the National Natural Science Foundation of China under Grant Nos 60877017,61176072 and 11074162;the Shanghai Postdoctoral Sustentation Fund(11R21413300);the Program for Changjiang Scholars and Innovative Research Team in University(No IRT0739);Shanghai Leading Academic Disciplines(S30107).
An n-ZnS/p-Si heterojunction was fabricated by using the rf magnetron sputtering method. The band gap of the ZnS film is about 3.63 eV. Current-voltage (I–V) characteristics of the ZnS/Si heterojunction are examined ...
Supported by the NPU Foundation for Fundamental Research under Grant Nos NPU-FFR-JC200821 and JC201048, the National Natural Science Foundation of China under Grant No 50702046, and the NWPU "Aoxiang Star" project.
An Al-doped ZnO/p-Si heterojunction is fabricated by a laser molecular beam epitaxy technique. The abnormally high ideality factors (n 〉〉 2) of the prepared heterojunction are observed in the interim bias voltage ...
Supported by the National Natural Science Foundation of China under Grant Nos 10874001, 50732001, 10674012 and 60877022, and the National Basic Research Program of China under Grant No 2007CB613402.
A pulsed InGaAsP-Si hybrid laser is fabricated using metal bonding. A novel structure in which the optical coupling and metal bonding areas are transversely separated is employed to integrate the silicon waveguide wit...
Supported by the National Natural Science Foundation of China under Grant No 60336010.
Indium tin oxide/Si-rich SiO2/p-Si structured devices are fabricated to study the electroluminescence (EL) of the Si-rich SiO2 (SRO) material. The obvious peaks at~1050nm and ~1260nm in the EL are ascribed to lo...
the National Natural Science Foundation of China under Grant No.59432022;State Key Laboratory for Integrated Optoelectronics.
After an Si oxide layer of 3nm thickness had been grown by using magnetron sputtering on a p-type Si(100)substrate,an indium tin oxide(ITO)film was deposited onto the Si oxide layer by using electron beam deposition.E...
Supported,by the National Natural Science Foundation of China under Grant No.59432022;the State Key Laboratory for Integrated Optoelectronics。
We have studied the effects ofγ-ray irradiation on electroluminescence(EL)from Au/extra thin Si-rich SiO_(2) film/p-Si Structures.Afterγ-ray irradiation,for the structure with a 600℃ annealed Si-rich SiO_(2) film a...