supported by the National Key Basic R&D Project of China(TG2011CB301900 and TG2012CB619304);the project of National High Technology of China(2011AA03A103);the National Natural Science Foundation of China(61076012 and60876063);the Beijing Municipal Science & Technology Commission(D111100001711002)
In order to solve the problems of GaN heteroepitaxy on sapphire substrate,some techniques were explored.Freestanding GaN substrates have been made by hydride vapor phase epitaxy(HVPE),laser lift-off(LLO),and chemical ...
Project supported by the National Basic Research Program of China (Grant No.2007CB307004);the National High Technology Research and Development Program of China (Grant No.2009AA03A198);the National Natural Science Foundation of China (Grant Nos.60776041 61076012,60876063,and 60676032);the Science and Technology Fund of Beijing,China (Grant No.Z101103050410003)
Two strain-state samples of GaN, labelled the strain-relief sample and the quality-improved sample, were grown by hydride vapour phase epitaxy (HVPE), and then characterized by high-resolution X-ray diffraction, pho...
supported by the National Natural Science Foundation of China(Grant Nos.60676032,60406007,60607003,60577030,60876063 and 60476028);the National Basic Research Program of China("973" Project)(Grant No.2007CB307004)
Wet etching has been widely used in defect evaluation for Ga-face GaN and surface roughness for N-face GaN dodecagonal pyramids has been fabricated on laser-lift-off N-face GaN by hot phosphor acid etching.The dodecag...
supported by the National Natural Science Foundation of China (Grant Nos. 60876063, 60676032, 60406007 and 60577030);the National Basic Research Program of China ("973" Project) (Grant No. TG2007CB307004)
Au/Sn solder bonding on Si substrates was used to fabricate the GaN-based vertical structure light emitting diodes (VSLEDs). The phase reaction of Au/Sn solder under different bonding conditions was investigated by th...