Project supported by the National Natural Science Foundation of China (Grant Nos 60736033 and 60506020)
This paper studies the degradation of device parameters and that of stress induced leakage current (SILC) of thin tunnel gate oxide under channel hot electron (CHE) stress at high temperature by using n-channel me...
supported by the National Natural Science Foundation of China (Nos. 60736033, 60506020)
The degradation of device under GIDL (gate-induced drain leakage current) stress has been studied using LDD NMOSFETs with 1.4 nm gate oxides. Experimental result shows that the degradation of device parameters depen...
Project supported by the National Natural Science Foundation of China (Grant Nos 60376024,60736033 and 60506020);the National High Technology Research and Development Program of China (Grant No 2003AA1Z1630)
The effect of substrate bias on the degradation during applying a negative bias temperature (NBT) stress is studied in this paper. With a smaller gate voltage stress applied, the degradation of negative bias tempera...