Project supported by the National Basic Research Program of China(Grant No.2011CBA00606);the National Natural Science Foundation of China(Grant No.61106106)
The degradation produced by hot carrier (HC) in ultra-deep sub-micron n-channel metal oxide semiconductor field effect transistor (nMOSFET) has been analyzed in this paper. The generation of negatively charged int...
In this paper based on the forward gated-diode configuration, the hot carrier behavior of the SOI (Silicon-on-insulator) nMOSFET's operating in a Bi-MOS hybrid mode (abbreviated as Bi-nMOSFET) is investigated. The per...
The hot-carrier-induced oxide breakdown i s systematically clarified for partially depleted SOI NMOSFET's fabricated on SI MOX wafer.The gate oxide properties are considered to analyze the channel hot-c arrier effects...