Project supported by the National Scientific Major Projects of China (Grant No. 2011ZX03004-001-02);the National Natural Science Foundation of China (Grant No. 60806024)
The left-handed nonlinear transmission line (LH-NLTL) based on monolithic microwave integrated circuit (MMIC) technology possesses significant advantages such as wide frequency band, high operating frequency, high...
Project supported by the National Natural Science Foundation of China(No.60806024);the International Collaboration Program of the Ministry of Science and Technology(No.2009DFA12130)
A broadband frequency doubler using left-handed nonlinear transmission lines(LH NLTLs) based on MMIC technology is reported for the first time.The second harmonic generation on LH NLTLs was analyzed theoretically. A...
Project supported by the Young Scientists Fund of the National Natural Science Foundation of China (Grant No. 60806024);the Fundamental Research Funds for Central Universities, China (Grant No. XDJK2009C020);the Singapore–China Joint Research Project (Grant No. 2009DFA12130)
A fabrication technology of GaAs planar Schottky varactor diode (PSVD) is successfully developed and used to design and manufacture CaAs-based monolithic frequency multiplication based on 23-section nonlinear transm...
Project supported by the National Natural Science Foundation of China(No.60806024)
A millimeter wave large-signal model of GaAs planar Schottky varactor diodes based on a physical analysis is presented.The model consists of nonlinear resistances and capacitances of the junction region and external p...
Project supported by the Young Scientists Fund of the National Natural Science Foundation of China (Grant No. 60806024);the Fundamental Research Funds for Central University of China (Grant No. XDJK2009C020)
GaAs-based planar Gunn diodes with A1GaAs hot electron injector have been successfully developed to be used as a local oscillator of 76 GHz in monolithic millimeter-wave integrated circuits. We designed two kinds of s...
supported by the Young Scientists Fund of the National Natural Science Foundation of China(No.60806024);the Fundamental Research Funds for Central University,China(No.XDJK2009C020)
A new PMMA/PMGI/ZEP520/PMGI four-layer resistor electron beam lithography technology is successfully developed and used to fabricate a 120 nm gate-length lattice-matched In_(0.53)Ga_(0.47)As/In_(0.52)Al_(0.48)...
Project supported by the National Natural Science Foundation of China(No.60806024);the Fundamental Research Funds for the Central Universities,China(No.XDJK2009C020).
120 nm gate-length In_(0.7)Ga_(0.3)As/In_(0.52)Al_(0.48) As InP-based high electron mobility transitions(HEMTs) are fabricated by a new T-shaped gate electron beam lithograph(EBL) technology,which is achie...