financially supported by the National Basic Research Program of China (Nos. 2012CB619303 and 2012CB619304);the National Natural Science Foundation of China (Nos. 11023003, 10990102, 11174008 and 61076012);the National High Technology Research & Development Project of China (No. 2011AA03A103)
The growth and properties of N-polar Ga N layers by metal organic chemical vapor deposition(MOCVD) were reported. It is found that N-polar Ga N grown on normal sapphire substrate shows hexagonal hillock surface morp...