Project supported by the National Basic Research Program of China(Grant No.2013CB632103);the National Natural Science Foundation of China(Grant Nos.61176013 and 61036003);the Science Fund from Beijing Science and Technology Commission,China(Grant No.Z151100003315019)
We report a lateral Ge-on-Si ridge waveguide light emitting diode (LED) grown by ultrahigh vacuum chemical vapor deposition (UHV-CVD). Direct-bandgap electroluminescence (EL) of Ge waveguide under continuous cur...
Project supported by the National Key Basic Research Program of China(Grant Nos.2012CB933503 and 2013CB632103);the National Natural Science Foundation of China(Grant Nos.61176092,61036003,and 60837001);the Ph.D.Programs Foundation of Ministry of Education of China(Grant No.20110121110025);the Fundamental Research Funds for the Central Universities,China(Grant No.2010121056)
Ge condensation process of a sandwiched structure of Si/SiGe/Si on silicon-on-insulator (SOI) to form SiGe-on- insulator (SGOI) substrate is investigated. The non-homogeneity of SiGe on insulator is observed after...
Project supported by the National Basic Research Program of China (Grant Nos.2012CB933503 and 2013CB632103);the National Natural Science Foundation of China (Grant Nos.61176092,61036003,and 60837001);the Ph.D.Program Foundation of the Ministry of Education of China (Grant No.20110121110025);the Fundamental Research Funds for the Central Universities,China (Grant No.2010121056)
Ge nano-belts with large tensile strain are considered as one of the promising materials for high carrier mobility metal- oxide-semiconductor transistors and efficient photonic devices. In this paper, we design the Ge...
Project supported by the National Natural Science Foundation of China (Grant Nos. 61176092,61036003,and 60837001);the National Basic Research Program of China (Grant No. 2012CB933503);the Ph.D. Program Foundation of Ministry of Education of China (Grant No. 20110121110025);the Fundamental Research Funds for the Central Universities,China (Grant No. 2010121056)
Wet thermal annealing effects on the properties of TaN/HfO2/Ge metal-oxide-semiconductor (MOS) structures with and without a GeO2 passivation layer are investigated. The physical and the electrical properties are ch...