supported in part by National Natural Science Foundation of China(Grant Nos.2019B010145001,616340084,61821091,61888102)。
Dear editor,Ferroelectric tunneling FETs(FeTFETs)are the increasingly significant research topics on novel low-power electronic devices[1,2],because ferroelectric materials’negative capacitance effect is helpful to b...
Project supported by the Natural Science Research Key Project of Universities of Anhui Province,China(Grant No.KJ2017A502);the Introduced Talent Project of Anhui Science and Technology University,China(Grant No.DQYJ201603);the Excellent Talents Supported Project of Colleges and Universities,China(Grant No.gxyq2018048)。
The tunnel field-effect transistor (TFET) is proposed by using the advantages of dopingless and line-tunneling technology. The line tunneling is created due to the fact that the gate electric field is aligned with the...
supported by Women Scientist Scheme-A, Department of Science and Technology, New Delhi, Government of India, under the Grant SR/WOS-A/ET-5/2017
This paper presents a compact two-dimensional analytical device model of surface potential,in addition to electric field of triple-material double-gate(TMDG)tunnel FET.The TMDG TFET device model is developed using a p...
Defect-based engineering of carbon nanostructures is becoming an important and powerful method to modify the electron transport properties in graphene nanoribbon FETs. In this paper, the impact of the position and sym...
Project supported by the University Natural Science Research Key Project of Anhui Province(No.KJ2017A502);the Talents Project of Anhui Science and Technology University(No.DQYJ201603);the Excellent Talents Supported Project of Colleges and Universities(No.gxyq2018048)
Analytical models are presented for a negative capacitance double-gate tunnel field-effect transistor(NC DG TFET) with a ferroelectric gate dielectric in this paper. The model accurately calculates the channel poten...
A double-gate tunnel field-effect transistor (DG tunnel FET) has been designed and investigated for various channel materials such as silicon (Si), gallium arsenide (GaAs), alminium gallium arsenide (A1xGa1-xAs...
Project supported by the National Natural Science Foundation of China(Grant Nos.61176038 and 61474093);the Science and Technology Planning Project of Guangdong Province,China(Grant No.2015A010103002);the Technology Development Program of Shanxi Province,China(Grant No.2016GY075)
In this work, a double-gate-all-around tunneling field-effect transistor is proposed. The performance of the novel device is studied by numerical simulation. The results show that with a thinner body and an additional...
The major purpose of this paper is to find an alternative configuration that not only minimizes the limitations of single-gate(SG) MOSFETs but also provides the better replacement for future technology.In this paper...
Project supported by the National Natural Science Foundation of China(No.61376106);the University Natural Science Research Key Project of Anhui Province(No.KJ2016A169);the Introduced Talents Project of Anhui Science and Technology University
A two-dimensional analytical model of double-gate(DG) tunneling field-effect transistors(TFETs) with interface trapped charges is proposed in this paper. The influence of the channel mobile charges on the potentia...
Project supported by the National Natural Science Foundation of China(Grant Nos.61376099,11235008,and 61205003)
The two-dimensional models for symmetrical double-material double-gate (DM-DG) strained Si (s-Si) metal-oxide semiconductor field effect transistors (MOSFETs) are presented. The surface potential and the surface...