This work is funded by the Defense Industrial Technology Development Program(No.JCKY2019603B005);National Natural Science Foundation of China(Nos.52076054,51777045);the Hunan Science and Technology Innovation Project(No.2019RS1102).
In this study,the neutral gas distribution and steady-state discharge under different discharge channel lengths were studied via numerical simulations.The results show that the channel with a length of 22 mm has the a...
support from the National Basic Research Program of China(No.2016YFA0200101);the National Natural Science Foundation of China(Nos.21733001 and 21525310);Boya Postdoctoral Fellowship.
The formation of heterojunction within solid-state devices enables them with eventually high performances,but provides a challenge for material synthesis and device fabrication because strict conditions such as lattic...
Project supported by the Foundation Project of the Science and Technology on Electro-Optical Information Security Control Laboratory,China(Grant No.614210701041705)
Using the semi-insulating property and small lattice constant a of wurtzite BGaN alloy, we propose a BGaN buffer with a B-content of 1% to enhance two-dimensional electron gas(2 DEG) confinement in a short-gate AlGaN/...
supported by the Science and Engineering Research Board(SERB),Department of Science and Technology,Ministry of Human Resource and Development,Government of India under Young Scientist Research(Grant No.SB/FTP/ETA-415/2012)
In this paper, a surface potential based threshold voltage model of fully-depleted(FD) recessed-source/drain(Re-S/D)silicon-on-insulator(SOI) metal-oxide semiconductor field-effect transistor(MOSFET) is presen...
The present work gives some insight into the subthreshold behaviour of short-channel double-material- gate strained-silicon on silicon-germanium MOSFETs in terms of subthreshold swing and off-current. The formu- latio...
This paper presents the analytical modeling of subthreshold current and subthreshold swing of short- channel fully-depleted (FD) strained-Si-on-insulator (SSOI) MOSFETs having vertical Gaussian-like doping pro- fi...
Supported by the Opening Project of Science and Technology on Reliability Physics and Application Technology of Electronic Component Laboratory(ZHD201205);the National Natural Science Foundation of China(61106103 and 61107031).
The total ionizing dose effects of partially depleted silicon-on-insulator(SOI)transistors in a 0.13𝜈m technology are studied by^(60)Co𝛿-ray irradiation.Radiation enhanced drain-induced barrier lowering(DIBL)under d...
An analytic drain current model is presented for doped short-channel double-gate MOSFETs with a Gaussian-like doping profile in the vertical direction of the channel. The present model is valid in linear and satura- t...
Supported by the National Natural Science Foundation of China (Grant No. 60206006);Program for the New Century Excellent Talents of Ministry of Education of China (Grant No. 681231366);the National Defense Pre-Research Foundation of China (Grant No. 51308040103)
Dual-material gate MOSFET with dielectric pockets (DMGDP MOSFET) is proposed to eliminate the potential weakness of the DP MOSFET for CMOS scaling toward the 32 nm gate length and beyond. The short-channel effects (SC...
The field-effect transistor is inherently bipolar, having simultaneously electron and hole surface and volume channels and currents. The channels and currents are controlled by one or more externally applied transvers...