National Natural Science Foundation of China (50472068, 50721002);National "863" High Technology Research and Development Program of China (2006AA03A145, 2007AA03Z405);National Basic Research Program of China (2009CB930503);The Cultivation Fund of the Key Scientific and Technical Innovation Project, Ministry of Education of China (707039)
Chemical mechanical polishing (CMP) was used to etch various GaN materials, such as GaN layers on sapphire and silicon carbide substrates grown by metal-organic chemical vapor deposition and thick GaN layers grown by ...
supported by the National Natural Science Foundation of China(No.50472068);the Program for New Century Excellent Talents in University.
Asymmetric broad-waveguide separate-confinement heterostructure(BW-SCH) quantum well(QW) laser diode emitting at 808 nm is analyzed and designed theoretically.The dependence of the optical field distribution, vert...
supported by the National Natural Science Foundation of China (No.50472068);the Program for New Century Excellent Talents in University
In order to improve the characteristics of the general broad-waveguide 808-nm semiconductor laser diode (LD), we design a new type quantum well LD with an asymmetric cladding structure. The structure is grown by met...
the National Natural Science Foundation of China (No. 50472068);Natural Science Foundation of Shandong Province,(No. Y2006F15);Shandong Provincial Significant Science and Technology Attack Project (No. 2005GG2107001);Shandong Provincial Independent Innovation Significant Science and Technology Special Plan (No. 2006GG1103046)
6H-SiC bulk crystals have been prepared by sublimation method in an inductively heated growth reactor. The effect of nitrogen doping on absorption for 6H-SiC was investigated. The absorption measurement based on optic...
the National Natural Science Foundation of China (No. 50472068);the Program for New Century Excellent Talents in University
Choice of crucible material is a key issue during the growth of AIN crystal. The stabilities at high temperature and life-spans of boron nitride (BN) crucible, tantalum (Ta) crucible and tungsten (W) crucible we...
supported by the National Natural Science Foundation of China(Grant No.60025409 and No.50472068);supported by the National High-Tech Research and Development Program of China(863 Program,Grant No.2001AA311080).
The surface polishing for silicon carbide (SIC) substrates was investigated and results were presented for mechanical polishing (MP) and chemo-mechanical polishing (CMP). High quality surfaces were obtained afte...
This work was financially supported by the National Natural Science Foundation of China (Nos. 60025409 and 50472068) and by the National "863" High Technology Plan (No. 2001AA311080).
Residual stresses in SiC wafers, which were introduced during production processes including sawing, lapping, mechanical polishing (MP), and chemical-mechanical polishing (CMP), were evaluated in terms of changes ...