Project supported by the National Basic Research Program of China(Grant No.2011CBA00602);the National Science and Technology Major Project of the Ministry of Science and Technology of China(Grant No.2011ZX02708-002)
Various biaxial compressive strained GaSb p-channel metal-oxide-semiconductor field-effect transistors (MOSFETs) are experimentally and theoretically investigated, The biaxial compressive strained GaSb MOSFETs show ...
Project supported by the National Basic Research Program of China(Grant No.2011CBA00602);the National Science and Technology Major Project of the Ministry of Science and Technology of China(Grant No.2011ZX02708-002)
GaSb p-channel metal-oxide-semiconductor field-effect transistors (MOSFETs) with an atomic layer deposited Al2O3 gate dielectric and a self-aligned Si-implanted source/drain are experimentally demonstrated. Temperat...
supported by the National Natural Science Foundation of China(Grant Nos.61322408,61221004,61422407,61334007,61474136,61274091,61376112,61306117,61106119,and 61106082);National Basic Research Program of China(Grant No.2011CBA00602);National High Technology Research and Development Program of China(Grant Nos.2014AA032900,2013AA030801,2011AA010401 and 2011AA-010402)
In this paper, different electrical measurement and operation methods of resistive random access memory (RRAM) have been summarized, including voltage sweeping mode (VSM), current sweeping mode (CSM), co lstant ...
supported by the National Natural Science Foundation of China(61322408,61221004,61334007,61274091,61106119 and 61106082);National Basic Research Program of China(2010CB934200 and 2011CBA00602);National High Technology Research and Development Program of China(2011AA010401 and 2011AA010402)
Resistive random access memory(RRAM) has been considered as one of the most promising candidates for next-generation nonvolatile memory, due to its advantages of simple device structure, excellent scalability, fast op...
supported by National Basic Research Program of China(Grant No.2011CBA00602);National Natural Science Foundation of China(Grant Nos.61106102,61176033)
In this paper,we have studied the total ionizing dose(TID)radiation response up to 2 Mrad(Si)of silicon-oxide-nitride-oxide-silicon(SONOS)memory cells and memory circuits,fabricated in a 130 nm complimentary met...
Project supported by the National Key Basic Research Program(No.2011CBA00602);the National Natural Science Foundation of China(Nos.61106102,61176033)
In order to minimize leakage current increase under total ionizing dose (TID) radiation in high density memory circuits, a new isolation technique, combining deep trench isolation (DTI) between the wells, local ox...