相关期刊:《Protection and Control of Modern Power Systems》《Communications in Theoretical Physics》《Chinese Journal of Polymer Science》《Chinese Physics B》更多>>
Project supported by the National Natural Science Foundation of China(Grant No.62104185);the Fundamental Research Funds for the Central Universities,China(Grant No.JB211103);the National Natural Science Foundation for Distinguished Young Scholars,China(Grant No.61925404);the Wuhu and Xidian University Special Fund for Industry–University-Research Cooperation,China(Grant No.XWYCXY-012021010)。
Dynamic characteristics of the single-crystal Ga N-passivated lateral AlGaN/GaN Schottky barrier diodes(SBDs)treated with proton irradiation are investigated.Radiation-induced changes including idealized Schottky inte...
supported by the MSIT(Ministry of Science and ICT),Korea,under the ITRC(Information Technology Research Center)support program(IITP-2020-2018-0-01421)supervised by the IITP(Institute for Information&communications Technology Promotion);then Samsung Electronics.
A split gate MOSFET(SG-MOSFET)is widely known for reducing the reverse transfer capacitance(C_(RSS)).In a 3.3 kV class,the SG-MOSFET does not provide reliable operation due to the high gate oxide electric field.In add...
supported by the National Science and Technology Major Project(No.2017YFB0102302)。
A 4H-SiC power MOSFET with specific on-resistance of 3.4 mΩ·cm^2 and breakdown voltage exceeding 1.5 kV is designed and fabricated.Numerical simulations are carried out to optimize the electric field strength in gat...
Project supported by the Guangxi Natural Science Foundation of China(No.2013GXNSFAA019335);the Guangxi Department of Education Project(No.201202ZD041);the China Postdoctoral Science Foundation Project(Nos.2012M521127,2013T60566);the National Natural Science Foundation of China(Nos.61361011,61274077,61464003)
A new high-voltage LDMOS with linearly-distanced fixed charge islands is proposed (LFI LDMOS). A lot of linearly-distanced fixed charge islands are introduced by implanting the Cs or I ion into the buried oxide laye...
supported by the National Natural Science Foundation of China(No.61274080);the Natural Science Foundation of Jiangsu Province(No.BK2011753);the Postdoctoral Science Foundation of China(No.2013M541585)
A lateral double-diffused metal-oxide-semiconductor field effect transistor (LDMOST) with multiple n-regions in the p-substrate is investigated in detail. Because of the decrescent n-regions, the electric field dist...
Project supported by the National Natural Science Foundation of China(No.61176069);the Program for New Century Excellent Talentsin University of Ministry of Education of China(No.NCET-11-0062);the China Postdoctoral Science Foundation(No.2012T50771)
A low specific on-resistance(R on;sp/ SOI NBL TLDMOS(silicon-on-insulator trench LDMOS with an N buried layer) is proposed. It has three features: a thin N buried layer(NBL) on the interface of the SOI layer/bur...
supported by the National Natural Science Foundation of China (Grant No. 61176069);the State Key Laboratory Science Fund of Electronic Thin Films and Integrated Devices of China (Grant No. CXJJ201004);the National Key Laboratory Science Fund of Analog Integrated Circuit,China (Grant No. 9140C090304110C0905)
A novel low specific on-resistance (Ron,sp) silicon-on-insulator (SO1) p-channel lateral double-diffused metal-oxide semiconductor (pLDMOS) compatible with high voltage (HV) n-channel LDMOS (nLDMOS) is propo...
supported by the Guangxi Natural Science Foundation of China(No.2010GXNSFB013054);the Guangxi Key Science and Technology Program ofChina(No.11107001-20)
A new silicon-on-insulator(SOI) high-voltage MOSFET structure with a compensation layer on the trenched buried oxide layer(CL T-LDMOS) is proposed.The high density inverse interface charges at the top surface of the b...
the Higher Education Commission of Pakistan for providing financial support as indigenous scholarship Batch-IV
Surface properties of SiC power devices mostly depend on the passivation layer(PL).This layer has direct influence on electrical characteristics of devices.2D numerical simulation of forward and reverse characteristic...
supported by the National Natural Science Foundation of China(Nos.60976060,61176069);the National Key Laboratory of AnalogIntegrated Circuit(NLAIC),China(No.9140C090304110C0905);the State Key Laboratory of Electronic Thin Films and Integrated Devices,China(No.CXJJ201004)
An integrable silicon-on-insulator (SOl) power lateral MOSFET with a trench gate and a recessed drain (TGRD MOSFET) is proposed to reduce the on-resistance. Both of the trench gate extended to the buried oxide (...