Mg-doped GaN layers prepared by metalorganic chemical vapor deposition were annealed at temperatures between 550 and 950℃. Room temperature (RT) Hall and photoluminescence (PL) spectroscopy measurements were perf...
对采用MOCVD(metalorganic chemical vapor phase deposition)技术生长在GaN/Sapphire衬底上的InN薄膜进行了Hall、吸收谱以及低温光致发光(photoluminescence,PL)谱的测量和分析.Hall测量发现,样品的载流子浓度分布在1018~1019cm-3.在...